Mehmood Rashid, Mofarah Sajjad S, Chen Wen-Fan, Koshy Pramod, Sorrell Charles C
School of Materials Science and Engineering, Faculty of Science , UNSW Sydney , Sydney , NSW 2052 , Australia.
Inorg Chem. 2019 May 6;58(9):6016-6027. doi: 10.1021/acs.inorgchem.9b00330. Epub 2019 Apr 22.
Oxygen vacancy concentrations are critical to the redox/photocatalytic performance of nanoceria, but their direct analysis is problematic under controlled atmospheres but essentially impossible under aqueous conditions. The present work provides three novel approaches to analyze these data from XPS data for the three main morphologies of nanoceria synthesized under aqueous conditions and tested using in vacuo analytical conditions. First, the total oxygen vacancy concentrations are decoupled quantitatively into surface-filled, subsurface-unfilled, and bulk values. Second, the relative surface areas are calculated for all exposed crystallographic planes. Third, XPS and redox performance data are deconvoluted according to the relative surface areas of these planes. Correlations based on two independent empirical results from volumetric surface XPS, combined with sequential deep XPS and independent EELS data, confirm that these approaches provide quantitative determinations of the different oxygen vacancy concentrations. Critically, the redox/photocatalytic performance depends not on the total oxygen vacancy concentration but on the concentration of the active sites on each plane in the form of subsurface-unfilled oxygen vacancies. This is verified by the pH-dependent performance, which can be increased significantly by exposing these vacancies to the surroundings. These approaches have significance to the design and engineering of semiconducting materials exposed to the environment.
氧空位浓度对纳米氧化铈的氧化还原/光催化性能至关重要,但其直接分析在可控气氛下存在问题,而在水性条件下几乎不可能。本工作提供了三种新颖的方法,用于从在水性条件下合成并在真空分析条件下测试的三种主要形态的纳米氧化铈的XPS数据中分析这些数据。首先,将总氧空位浓度定量解耦为表面填充、次表面未填充和体相值。其次,计算所有暴露晶面的相对表面积。第三,根据这些晶面的相对表面积对XPS和氧化还原性能数据进行反褶积。基于来自体积表面XPS的两个独立经验结果的相关性,结合顺序深度XPS和独立EELS数据,证实这些方法能够对不同的氧空位浓度进行定量测定。至关重要的是,氧化还原/光催化性能并不取决于总氧空位浓度,而是取决于以次表面未填充氧空位形式存在于每个晶面上的活性位点浓度。这通过pH依赖性性能得到验证,将这些空位暴露于周围环境可显著提高该性能。这些方法对暴露于环境中的半导体材料的设计和工程具有重要意义。