Chen Qianqian, Ozkan Alp, Chattopadhyay Basab, Baert Kitty, Poleunis Claude, Tromont Alisson, Snyders Rony, Delcorte Arnaud, Terryn Herman, Delplancke-Ogletree Marie-Paule, Geerts Yves H, Reniers François
Research Group Electrochemical and Surface Engineering , Vrije Universiteit Brussel , Pleinlaan 2 , 1050 Brussels Belgium.
Institute of Condensed Matter and Nanosciences , Université Catholique de Louvain , 1348 Louvain-la-Neuve , Belgium.
Langmuir. 2019 Jun 4;35(22):7161-7168. doi: 10.1021/acs.langmuir.9b00784. Epub 2019 May 22.
This work presents a simple, fast (20 min treatment), inexpensive, and highly efficient method for synthesizing nitrogen-doped titanium dioxide (N-TiO) as an enhanced visible light photocatalyst. In this study, N-TiO coatings were fabricated by atmospheric pressure dielectric barrier discharge (DBD) at room temperature. The composition and the chemical bonds of the TiO and N-TiO coatings were characterized by X-ray photoelectron spectroscopy (XPS) and time-of-flight secondary ion mass spectroscopy (ToF-SIMS). The results indicate that the nitrogen element has doped the TiO lattice, which was further confirmed by Raman spectroscopy and grazing incidence X-ray diffraction (GIXRD). The doping mechanism was investigated using OES to study the plasma properties under different conditions. It suggests that the NH radicals play a key role in doping TiO. The concentration of nitrogen in the N-TiO coatings can be controlled by changing the concentration of NH in the plasma or the applied power to adjust the concentration of NH radicals in the plasma. The band gap of N-TiO was reduced after NH/Ar plasma treatment from 3.25 to 3.18 eV. Consequently, the N-TiO coating showed enhanced photocatalytic activity under white-light-emitting-diode (LED) irradiation. The photocatalytic degradation rate for the N-TiO coating was about 1.4 times higher than that of the undoped TiO coating.
这项工作提出了一种简单、快速（20分钟处理时间）、廉价且高效的方法来合成氮掺杂二氧化钛（N-TiO）作为增强型可见光光催化剂。在本研究中，通过室温下的大气压介质阻挡放电（DBD）制备了N-TiO涂层。采用X射线光电子能谱（XPS）和飞行时间二次离子质谱（ToF-SIMS）对TiO和N-TiO涂层的组成和化学键进行了表征。结果表明，氮元素已掺杂到TiO晶格中，拉曼光谱和掠入射X射线衍射（GIXRD）进一步证实了这一点。利用发射光谱（OES）研究不同条件下的等离子体特性，对掺杂机理进行了研究。结果表明，NH自由基在TiO掺杂过程中起关键作用。通过改变等离子体中NH的浓度或施加的功率来调节等离子体中NH自由基的浓度，可以控制N-TiO涂层中的氮浓度。经过NH/Ar等离子体处理后，N-TiO的带隙从3.25 eV降低到3.18 eV。因此，N-TiO涂层在白色发光二极管（LED）照射下表现出增强的光催化活性。N-TiO涂层的光催化降解速率比未掺杂的TiO涂层高约1.4倍。
