National Nanotechnology Center (NANOTEC), National Science and Technology Development Agency (NSTDA), Pathum Thani, 12120, Thailand.
Department of Materials Engineering, Faculty of Engineering, Kasetsart University, Bangkok, 10900, Thailand.
Mikrochim Acta. 2019 May 15;186(6):349. doi: 10.1007/s00604-019-3461-2.
A two-step patterning process was developed based on nanosphere lithography and plasma etching to fabricate an array of electrodes with two different gold ring structures: the arrays of Au micro-ring electrode (Au-MRE) and Au covered with polystyrene micro-ring electrode (Au-PS-MRE). The Au-MRE structure was fabricated by etching a monolayer of polystyrene (PS) spheres on indium tin oxide (ITO) surface to generate PS rings on ITO glass. PS rings served as a mask in secondary etching for blocking an interaction of oxygen plasma and ITO surface to create a ring-patterned ITO surface. Then, the PS residue was removed and gold was deposited. The site-selective electrodeposition of gold was carried out and an array of a gold ring structure was formed on the ITO glass. The Au-PS-MRE structure was fabricated by keeping the PS residue from second etching before deposition of gold. The Au-PS-MRE microelectrode was studied by using hexacyanoferrate as an electrochemical probe where it displayed steady state current in cyclic voltammetry. The respective calibration plots were acquired at a working potential of 0.31 V and 0.12 V (vs. Ag/AgCl) for oxidation and reduction reaction, respectively. The sensitivity is as high as 163.4-220.7 μA·mM·mm which is larger by a factor of 95-132 compared to a conventional gold film macroelectrode. The detection limit (at a signal-to-noise ratio of 3) is 2.2 μM. This approach thus yields relatively effective and low-cost fabrication without resorting to high resolution instruments. Conceivably, the technique may be used to produce microelectrode arrays on a large scale. Graphical abstract Schematic presentation of a novel fabrication process of micro-ring electrode arrays. Two-step patterning based on nanosphere lithography leads to electrodes with great electrochemical performance. Direct deposition metal in the presence of polystyrene (PS) mask induces the formation of a new structure with arrays of gold covered with PS microring on the indium tin oxide (ITO) coated glass. The microelectrode-like behavior has been achieved using this fabrication process.
提出了一种两步图形化工艺,基于纳米球光刻和等离子体刻蚀技术在氧化铟锡(ITO)玻璃上制备具有两种不同金环结构的电极阵列:金微环电极(Au-MRE)和金覆盖聚苯乙烯微环电极(Au-PS-MRE)阵列。Au-MRE 结构是通过在 ITO 表面刻蚀单层聚苯乙烯(PS)球体制备的,在 ITO 玻璃上生成 PS 环。PS 环在二次刻蚀中作为掩模,阻挡氧等离子体与 ITO 表面的相互作用,从而在 ITO 表面形成环形图案。然后,去除 PS 残留物并沉积金。进行金的选择性电沉积,在 ITO 玻璃上形成金环形结构的阵列。Au-PS-MRE 结构是通过在沉积金之前保留二次刻蚀中的 PS 残留物来制备的。使用六氰合铁酸盐作为电化学探针研究了 Au-PS-MRE 微电极,在循环伏安法中显示出稳定的稳态电流。在工作电位 0.31 V 和 0.12 V(相对于 Ag/AgCl)下分别获得了氧化和还原反应的相应校准曲线。灵敏度高达 163.4-220.7 μA·mM·mm,比传统的金膜宏电极大 95-132 倍。检测限(信噪比为 3)为 2.2 μM。这种方法无需使用高分辨率仪器即可实现相对有效且低成本的制造。可以想象,该技术可用于大规模生产微电极阵列。 示意图呈现了一种新颖的微环电极阵列制造工艺。基于纳米球光刻的两步图形化导致具有出色电化学性能的电极。在聚苯乙烯(PS)掩模存在下直接沉积金属会导致在涂覆 ITO 的玻璃上形成具有 PS 微环阵列的金的新结构。通过这种制造工艺实现了微电极样的行为。