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纳米球光刻法制备参数对沉积的金-银纳米颗粒阵列性质的影响。

Effect of the Fabrication Parameters of the Nanosphere Lithography Method on the Properties of the Deposited Au-Ag Nanoparticle Arrays.

作者信息

Liu Jing, Chen Chaoyang, Yang Guangsong, Chen Yushan, Yang Cheng-Fu

机构信息

School of Information Engineering, Jimei University, Xiamen 361021, China.

Department of Chemical and Materials Engineering, National University of Kaohsiung, No. 700, Kaohsiung University Rd., Nan-Tzu District, Kaohsiung 811, Taiwan.

出版信息

Materials (Basel). 2017 Apr 3;10(4):381. doi: 10.3390/ma10040381.

DOI:10.3390/ma10040381
PMID:28772741
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC5506964/
Abstract

The nanosphere lithography (NSL) method can be developed to deposit the Au-Ag triangle hexagonal nanoparticle arrays for the generation of localized surface plasmon resonance. Previously, we have found that the parameters used to form the NSL masks and the physical methods required to deposit the Au-Ag thin films had large effects on the geometry properties of the nanoparticle arrays. Considering this, the different parameters used to grow the Au-Ag triangle hexagonal nanoparticle arrays were investigated. A single-layer NSL mask was formed by using self-assembly nano-scale polystyrene (PS) nanospheres with an average radius of 265 nm. At first, the concentration of the nano-scale PS nanospheres in the solution was set at 6 wt %. Two coating methods, drop-coating and spin-coating, were used to coat the nano-scale PS nanospheres as a single-layer NSL mask. From the observations of scanning electronic microscopy (SEM), we found that the matrixes of the PS nanosphere masks fabricated by using the drop-coating method were more uniform and exhibited a smaller gap than those fabricated by the spin-coating method. Next, the drop-coating method was used to form the single-layer NSL mask and the concentration of nano-scale PS nanospheres in a solution that was changed from 4 to 10 wt %, for further study. The SEM images showed that when the concentrations of PS nanospheres in the solution were 6 and 8 wt %, the matrixes of the PS nanosphere masks were more uniform than those of 4 and 10 wt %. The effects of the one-side lifting angle of substrates and the vaporization temperature for the solvent of one-layer self-assembly PS nanosphere thin films, were also investigated. Finally, the concentration of the nano-scale PS nanospheres in the solution was set at 8 wt % to form the PS nanosphere masks by the drop-coating method. Three different physical deposition methods, including thermal evaporation, radio-frequency magnetron sputtering, and e-gun deposition, were used to deposit the Au-Ag triangle hexagonal periodic nanoparticle arrays. The SEM images showed that as the single-layer PS nanosphere mask was well controlled, the thermal evaporation could deposit the Au-Ag triangle hexagonal nanoparticle arrays with a higher quality than the other two methods.

摘要

可以开发纳米球光刻(NSL)方法来沉积金-银三角形六边形纳米粒子阵列,以产生局域表面等离子体共振。此前,我们发现用于形成NSL掩膜的参数以及沉积金-银薄膜所需的物理方法对纳米粒子阵列的几何特性有很大影响。考虑到这一点,我们研究了用于生长金-银三角形六边形纳米粒子阵列的不同参数。通过使用平均半径为265nm的自组装纳米级聚苯乙烯(PS)纳米球形成单层NSL掩膜。首先,将溶液中纳米级PS纳米球的浓度设定为6wt%。使用滴涂和旋涂两种涂覆方法将纳米级PS纳米球涂覆为单层NSL掩膜。通过扫描电子显微镜(SEM)观察,我们发现使用滴涂法制备的PS纳米球掩膜的基质比旋涂法制备的更均匀,间隙更小。接下来,使用滴涂法形成单层NSL掩膜,并将溶液中纳米级PS纳米球的浓度从4wt%改变到10wt%,以进行进一步研究。SEM图像显示,当溶液中PS纳米球的浓度为6wt%和8wt%时,PS纳米球掩膜的基质比4wt%和10wt%时更均匀。还研究了基板的单侧提升角度和单层自组装PS纳米球薄膜溶剂的蒸发温度的影响。最后,将溶液中纳米级PS纳米球的浓度设定为8wt%,通过滴涂法形成PS纳米球掩膜。使用三种不同的物理沉积方法,包括热蒸发、射频磁控溅射和电子枪沉积,来沉积金-银三角形六边形周期性纳米粒子阵列。SEM图像显示,由于单层PS纳米球掩膜得到了很好的控制,热蒸发能够沉积出比其他两种方法质量更高的金-银三角形六边形纳米粒子阵列。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3259/5506964/667fb25e784a/materials-10-00381-g011.jpg
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https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3259/5506964/75a3c2facfeb/materials-10-00381-g009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3259/5506964/b9508726b631/materials-10-00381-g010.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3259/5506964/667fb25e784a/materials-10-00381-g011.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3259/5506964/8cc2cacb9cec/materials-10-00381-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3259/5506964/69549ab23c06/materials-10-00381-g002.jpg
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https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3259/5506964/43f2b590d784/materials-10-00381-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3259/5506964/c83c950f5577/materials-10-00381-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3259/5506964/a202f0380342/materials-10-00381-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3259/5506964/4ce2bc95de69/materials-10-00381-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3259/5506964/75a3c2facfeb/materials-10-00381-g009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3259/5506964/b9508726b631/materials-10-00381-g010.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3259/5506964/667fb25e784a/materials-10-00381-g011.jpg

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