Akinoglu Eser M, Morfa Anthony J, Giersig Michael
Department of Physics, Freie Universität Berlin , 14195 Berlin, Germany.
Langmuir. 2014 Oct 21;30(41):12354-61. doi: 10.1021/la500003u. Epub 2014 Mar 14.
Anisotropic deformation of polystyrene particles in an oxygenated (O2/Ar) plasma is observed for radio frequency (rf) plasma and inductively coupled plasma (ICP). A facile model based on a ratio of completely isotropic and completely anisotropic etching is presented to describe the anisotropy of the etching process and is implemented to determine the height of the spheroid-shaped polystyrene particles. In our systems, we find the plasma etching to be 54% isotropic in the rf plasma and 79% isotropic in the ICP. With this model, the maximum material deposition thickness for nanofabrication with plasma-etched nanosphere lithography or colloid lithography can be predicted. Moreover, the etching of polystyrene particles in an oxygenated plasma is investigated versus the etching time, gas flow, gas composition, temperature, substrate material, and particle size. The results of this study allow precise shape tuning during the fabrication of nanostructured surfaces with size-dependent properties for bionic, medical, and photonic applications.
在射频（rf）等离子体和电感耦合等离子体（ICP）中观察到聚苯乙烯颗粒在含氧（O2/Ar）等离子体中的各向异性变形。提出了一个基于完全各向同性和完全各向异性蚀刻比率的简易模型，以描述蚀刻过程的各向异性，并用于确定球形聚苯乙烯颗粒的高度。在我们的系统中，发现rf等离子体中的等离子体蚀刻各向同性为54%，ICP中的为79%。利用该模型，可以预测采用等离子体蚀刻纳米球光刻或胶体光刻进行纳米制造时的最大材料沉积厚度。此外，还研究了聚苯乙烯颗粒在含氧等离子体中的蚀刻与蚀刻时间、气体流量、气体成分、温度、衬底材料和颗粒尺寸的关系。这项研究的结果使得在制造具有尺寸依赖性特性的纳米结构表面以用于仿生、医学和光子应用时能够进行精确的形状调整。
