溅射温度对碳氟化合物薄膜的影响：表面纳米结构及氟/碳比

Effect of Sputtering Temperature on Fluorocarbon Films: Surface Nanostructure and Fluorine/Carbon Ratio.

作者信息

Zhao Qi, Wang Feipeng, Wang Kaizheng, Xie Guibai, Cui Wanzhao, Li Jian

机构信息

State Key Laboratory of Power Transmission Equipment & System Security and New Technology, Chongqing University, Chongqing 400044, China.

National Key Laboratory of Science and Technology on Space Microwave, China Academy of Space Technology (Xi'an), Xi'an 710100, China.

出版信息

Nanomaterials (Basel). 2019 Jun 3;9(6):848. doi: 10.3390/nano9060848.

DOI:10.3390/nano9060848

PMID:31163587

原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC6631040/

Abstract

In this work, fluorocarbon film was deposited on silicon (P/100) substrate using polytetrafluoroethylene (PTFE) as target material at elevated sputtering temperature. Field emission scanning electron microscopy (FESEM), atomic force microscopy (AFM), Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) were employed to investigate the surface morphology as well as structural and chemical compositions of the deposited film. The surface energy, as well as the polar and dispersion components, were determined by water contact angle (WCA) measurement. The experimental results indicated that increasing sputtering temperature effectively led to higher deposition rate, surface roughness and WCA of the film. It was found that the elevated temperature contributed to increasing saturated components (e.g., C-F and C-F) and decreasing unsaturated components (e.g., C-C and C-CF), thus enhancing the fluorine-to-carbon (F/C) ratio. The results are expected aid in tailoring the design of fluorocarbon films for physicochemical properties.

摘要

在本工作中，以聚四氟乙烯（PTFE）为靶材，在升高的溅射温度下将氟碳膜沉积在硅（P/100）衬底上。采用场发射扫描电子显微镜（FESEM）、原子力显微镜（AFM）、拉曼光谱和X射线光电子能谱（XPS）来研究沉积膜的表面形貌以及结构和化学成分。通过水接触角（WCA）测量来确定表面能以及极性和色散成分。实验结果表明，提高溅射温度有效地导致膜的沉积速率、表面粗糙度和WCA升高。发现升高的温度有助于增加饱和成分（例如，C-F和C-F）并减少不饱和成分（例如，C-C和C-CF），从而提高氟碳比（F/C）。预期这些结果有助于针对物理化学性质定制氟碳膜的设计。