在定向银和金纳米结构上生长三氧化钼纳米带：扫描电子显微镜（SEM）研究

Growth of Molybdenum Trioxide Nanoribbons on Oriented Ag and Au Nanostructures: A Scanning Electron Microscopy (SEM) Study.

作者信息

Maiti Paramita, Mitra Arijit, Juluri R R, Rath Ashutosh, Satyam Parlapalli V

机构信息

Institute of Physics, Sachivalaya Marg, Bhubaneswar 751005, Odisha, India.

Homi Bhabha National Institute, Training School Complex, Anushakti Nagar, Mumbai 400085, India.

出版信息

Microsc Microanal. 2019 Dec;25(6):1449-1456. doi: 10.1017/S1431927619014648.

DOI:10.1017/S1431927619014648

PMID:31210118

Abstract

We report the growth of molybdenum trioxide (MoO3) nanoribbons (NRs) on epitaxial Ag and oriented Au nanostructures (NSs) using an ultra-high vacuum (UHV)-molecular beam epitaxy (MBE) technique at different substrate temperatures. An approximately 2 nm silver (Ag) film has been deposited at different growth temperatures (using UHV-MBE) on cleaned Si(100), Si(110), and Si(111) substrates. For faceted Au NSs, an approximately 50 nm Au film has been deposited (using high-vacuum thermal evaporation) on a Si(100) substrate with a native oxide layer at the interface and the sample was annealed in low vacuum (≈10-2) and at high temperature (≈975°C). Scanning electron microscopy measurements were performed to determine the morphology of MoO3/Ag and MoO3/Au composite films. From energy dispersive X-ray spectroscopy elemental mapping and line scans it is found that faceted Au NSs are more favorable for the growth of MoO3 NRs than epitaxial Ag microstructures.

摘要

我们报道了使用超高真空（UHV）-分子束外延（MBE）技术在不同衬底温度下，在外延银和取向金纳米结构（NSs）上生长三氧化钼（MoO₃）纳米带（NRs）的情况。已在不同生长温度下（使用UHV-MBE）在清洁的Si(100)、Si(110)和Si(111)衬底上沉积了约2 nm的银（Ag）膜。对于刻面金纳米结构，已在具有界面处自然氧化层的Si(100)衬底上沉积了约50 nm的金膜（使用高真空热蒸发），并且样品在低真空（≈10⁻²）和高温（≈975°C）下进行了退火。进行扫描电子显微镜测量以确定MoO₃/Ag和MoO₃/Au复合膜的形态。从能量色散X射线光谱元素映射和线扫描发现，刻面金纳米结构比外延银微结构更有利于MoO₃纳米带生长。