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石墨烯场效应晶体管在通过原子力显微镜进行机械清洁过程中表面清洁度和电子特性的演变。

The evolution of surface cleanness and electronic properties of graphene field-effect transistors during mechanical cleaning with atomic force microscopy.

作者信息

Park Do-Hyun, Cho Young Jin, Lee Jun-Ho, Choi Inchul, Jhang Sung Ho, Chung Hyun-Jong

机构信息

Department of Physics, Konkuk University, Seoul 05030, Republic of Korea.

出版信息

Nanotechnology. 2019 Sep 27;30(39):394003. doi: 10.1088/1361-6528/ab2cf6. Epub 2019 Jun 26.

DOI:10.1088/1361-6528/ab2cf6
PMID:31242472
Abstract

The evolution of surface cleanliness and the electronic properties-Dirac voltage(V ), hysteresis and mobility (μ) of a graphene field-effect transistor (GFET)-were monitored by measuring lateral force microscopy and drain current (I ) as a function of gate voltage (V ), after mechanically cleaning the surface, scan-by-scan, with contact-mode atomic force microscopy. Both the surface cleanliness and the electronic properties evolved, showing a sudden improvement and then saturation for a mobility of around 2200 cm V s. We found that the mobility suppression of the as-fabricated GFET deviated from a randomly distributed impurities model, which predicted a greater mobility than obtained from the measured V . Therefore, the substrate impurities are excluded from the origins of the extraordinary suppression of the mobility, and the possible origin will be discussed.

摘要

通过在机械清洁表面后,使用接触模式原子力显微镜逐扫描测量横向力显微镜和漏极电流(I)随栅极电压(V)的变化,监测了石墨烯场效应晶体管(GFET)的表面清洁度演变以及电子特性——狄拉克电压(V)、滞后现象和迁移率(μ)。表面清洁度和电子特性均发生了演变,迁移率在约2200 cm² V⁻¹ s⁻¹ 时出现突然改善然后饱和。我们发现,制备好的GFET的迁移率抑制偏离了随机分布杂质模型,该模型预测的迁移率比从测量的V得出的迁移率更高。因此,衬底杂质被排除在迁移率异常抑制的起源之外,并将讨论可能的起源。

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