Park Do-Hyun, Cho Young Jin, Lee Jun-Ho, Choi Inchul, Jhang Sung Ho, Chung Hyun-Jong
Department of Physics, Konkuk University, Seoul 05030, Republic of Korea.
Nanotechnology. 2019 Sep 27;30(39):394003. doi: 10.1088/1361-6528/ab2cf6. Epub 2019 Jun 26.
The evolution of surface cleanliness and the electronic properties-Dirac voltage(V ), hysteresis and mobility (μ) of a graphene field-effect transistor (GFET)-were monitored by measuring lateral force microscopy and drain current (I ) as a function of gate voltage (V ), after mechanically cleaning the surface, scan-by-scan, with contact-mode atomic force microscopy. Both the surface cleanliness and the electronic properties evolved, showing a sudden improvement and then saturation for a mobility of around 2200 cm V s. We found that the mobility suppression of the as-fabricated GFET deviated from a randomly distributed impurities model, which predicted a greater mobility than obtained from the measured V . Therefore, the substrate impurities are excluded from the origins of the extraordinary suppression of the mobility, and the possible origin will be discussed.
通过在机械清洁表面后,使用接触模式原子力显微镜逐扫描测量横向力显微镜和漏极电流(I)随栅极电压(V)的变化,监测了石墨烯场效应晶体管(GFET)的表面清洁度演变以及电子特性——狄拉克电压(V)、滞后现象和迁移率(μ)。表面清洁度和电子特性均发生了演变,迁移率在约2200 cm² V⁻¹ s⁻¹ 时出现突然改善然后饱和。我们发现,制备好的GFET的迁移率抑制偏离了随机分布杂质模型,该模型预测的迁移率比从测量的V得出的迁移率更高。因此,衬底杂质被排除在迁移率异常抑制的起源之外,并将讨论可能的起源。