Atomic/Molecular Layer Deposited Iron-Azobenzene Framework Thin Films for Stimuli-Induced Gas Molecule Capture/Release.

The atomic/molecular layer deposition (ALD/MLD) technique provides an elegant way to grow crystalline metal-azobenzene thin films directly from gaseous precursors; the photoactive azobenzene linkers thus form an integral part of the crystal framework. Reversible water capture/release behavior for these thin films can be triggered through the trans-cis photoisomerization reaction of the azobenzene moieties in the structure. The ALD/MLD approach could open up new horizons for example, for the emerging fields of remotely controlled drug delivery and gas storage.