Scardamaglia Mattia, Struzzi Claudia, Zakharov Alexei, Reckinger Nicolas, Zeller Patrick, Amati Matteo, Gregoratti Luca
ChIPS, University of Mons , 7000 Mons , Belgium.
MAX IV Laboratory , University of Lund , 22100 Lund , Sweden.
ACS Appl Mater Interfaces. 2019 Aug 14;11(32):29448-29457. doi: 10.1021/acsami.9b08918. Epub 2019 Aug 1.
We performed spatially resolved near-ambient-pressure photoemission spectromicroscopy on graphene-coated copper in operando under oxidation conditions in an oxygen atmosphere (0.1 mbar). We investigated regions with bare copper and areas covered with mono- and bi-layer graphene flakes, in isobaric and isothermal experiments. The key method in this work is the combination of spatial and chemical resolution of the scanning photoemission microscope operating in a near-ambient-pressure environment, thus allowing us to overcome both the material and pressure gap typical of standard ultrahigh-vacuum X-ray photoelectron spectroscopy (XPS) and to observe in operando the protection mechanism of graphene toward copper oxidation. The ability to perform spatially resolved XPS and imaging at high pressure allows for the first time a unique characterization of the oxidation phenomenon by means of photoelectron spectromicroscopy, pushing the limits of this technique from fundamental studies to real materials under working conditions. Although bare Cu oxidizes naturally at room temperature, our results demonstrate that such a graphene coating acts as an effective barrier to prevent copper oxidation at high temperatures (over 300 °C), until oxygen intercalation beneath graphene starts from boundaries and defects. We also show that bilayer flakes can protect at even higher temperatures. The protected metallic substrate, therefore, does not suffer corrosion, preserving its metallic characteristic, making this coating appealing for any application in an aggressive atmospheric environment at high temperatures.
我们在氧气气氛(0.1毫巴)的氧化条件下,对石墨烯包覆的铜进行了近常压光发射光谱显微镜的原位空间分辨研究。在等压和等温实验中,我们研究了裸露铜区域以及覆盖有单层和双层石墨烯薄片的区域。这项工作的关键方法是将在近常压环境下运行的扫描光发射显微镜的空间分辨率和化学分辨率相结合,从而使我们能够克服标准超高真空X射线光电子能谱(XPS)典型的材料和压力差距,并原位观察石墨烯对铜氧化的保护机制。在高压下进行空间分辨XPS和成像的能力首次通过光电子能谱显微镜对氧化现象进行了独特的表征,将该技术的极限从基础研究推向了工作条件下的实际材料。尽管裸露的铜在室温下会自然氧化,但我们的结果表明,这种石墨烯涂层在高温(超过300°C)下可作为有效的屏障防止铜氧化,直到石墨烯下方的氧从边界和缺陷处开始插入。我们还表明,双层薄片在更高温度下也能起到保护作用。因此,受保护的金属基底不会遭受腐蚀,保持其金属特性,这使得这种涂层对于在高温侵蚀性大气环境中的任何应用都具有吸引力。