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一种适用于压力驱动的溶液可逆限制的多孔 POSiSil:PSS-2。

A Porous POSiSil Suited for Pressure-Driven Reversible Confinement of Solutions: PSS-2.

机构信息

Centre for Surface Chemistry and Catalysis - Characterization and Application Team, KULeuven, Celestijnenlaan 200f-2461, 3001, Leuven, Belgium.

出版信息

Chemistry. 2019 Oct 8;25(56):12957-12965. doi: 10.1002/chem.201901913. Epub 2019 Sep 19.

Abstract

Polyoligosiloxysilicone (POSiSil; designated PSS-2) is a copolymer of double four-ring (D4R) cyclosilicate and dimethylsiloxane. It is synthesized by linking D4R units in tetrabutylammonium cyclosilicate crystals with dimethyldichlorosilane. The structure of PSS-2 was revealed using solid state NMR spectroscopy. In this 3D copolymer D4R units are connected systematically by short siloxane chains most likely composed of 2 to 3 dimethylsiloxane monomers. Controlling the conversion of the parent material allows for tuning the porosity of PSS-2. Residual parent material is embedded inside PSS-2 polymer and can be eliminated by calcination. This leaves nanovoids inside PSS-2, which is moderately hydrophobic. Pressure-driven intrusion-extrusion cycles of aqueous solution exhibit hysteresis, thus, PSS-2 can be used as reversible confinement for liquids with a capacity of around 1000 mm  g in porosity.

摘要

聚硅氧烷(POSiSil;指定为 PSS-2)是双四环(D4R)环硅酸盐和二甲基硅氧烷的共聚物。它是通过将四丁基铵环硅酸盐晶体中的 D4R 单元与二甲基二氯硅烷连接合成的。使用固态 NMR 光谱揭示了 PSS-2 的结构。在这种 3D 共聚物中,D4R 单元通过短的硅氧烷链系统连接,这些硅氧烷链很可能由 2 到 3 个二甲基硅氧烷单体组成。控制母体材料的转化率可以调整 PSS-2 的孔隙率。残留的母体材料嵌入在 PSS-2 聚合物中,并可以通过煅烧去除。这在 PSS-2 内部留下纳米空隙,使其具有中等疏水性。水溶液的压力驱动侵入-挤出循环表现出滞后,因此,PSS-2 可以用作具有约 1000mm 3 g 孔隙率的液体的可逆限制。

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