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用于探测带电氧化物/水界面的门控和频振动光谱

Gate-Controlled Sum-Frequency Vibrational Spectroscopy for Probing Charged Oxide/Water Interfaces.

作者信息

Wang Hongqing, Xu Qian, Liu Zhihua, Tang Yiming, Wei Guanghong, Shen Y Ron, Liu Wei-Tao

机构信息

Physics Department, State Key Laboratory of Surface Physics, Key Laboratory of Micro and Nano Photonic Structures [Ministry of Education] , Fudan University , Shanghai 200433 , China.

Collaborative Innovation Center of Advanced Microstructures , Nanjing 210093 , China.

出版信息

J Phys Chem Lett. 2019 Oct 3;10(19):5943-5948. doi: 10.1021/acs.jpclett.9b01908. Epub 2019 Sep 20.

Abstract

The rich chemistry of oxide/aqueous interfaces originates from the interfacial layer formed by surface charges and adjoining water molecules. Yet not much is clear about such layers, because they are difficult to access, and measurements unavoidably collect signals from the diffuse layer nearby, which is perturbed by the surface potential extending into the bulk water. Here we show that gating of a semiconductor/oxide/water junction can effectively vary the surface charge density at the oxide/water interface but keep the surface potential low and barely varying, allowing effective removal of the diffuse layer contribution. With sum-frequency vibrational spectroscopy on a silicon/silica/deionized-water model junction, the variation of the bonded layer water structure in response to surface charging can be readily detected. This new scheme is generally applicable to all oxide/water interfaces, providing opportunities for future investigations at a deeper molecular level.

摘要

氧化物/水界面丰富的化学性质源于由表面电荷和相邻水分子形成的界面层。然而,关于此类界面层仍有很多不清楚的地方,因为它们难以触及,并且测量不可避免地会收集来自附近扩散层的信号,而扩散层会受到延伸到本体水中的表面电势的干扰。在此我们表明,半导体/氧化物/水结的门控可以有效地改变氧化物/水界面处的表面电荷密度,但保持表面电势较低且几乎不变,从而有效消除扩散层的贡献。通过对硅/二氧化硅/去离子水模型结进行和频振动光谱分析,可以很容易地检测到键合层水结构随表面电荷变化的情况。这种新方法普遍适用于所有氧化物/水界面,为未来在更深分子层面的研究提供了机会。

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