Division of Physics , Institute of Nuclear Energy Research , Taoyuan 32546 , Taiwan , ROC.
Department of Engineering and System Science , National Tsing Hua University , Hsinchu , 30043 , Taiwan , ROC.
ACS Appl Mater Interfaces. 2019 Sep 18;11(37):33803-33810. doi: 10.1021/acsami.9b08766. Epub 2019 Sep 10.
This paper presents a unique GdFeNiO perovskite thin film for use in pulse-controlled nonvolatile memory devices (combined with a SrTiO (STO) substrate) without the need for an electrical-stressing read-out process. The use of pulse voltage imposes permanent downward/upward polarization states on GFNO, which enables greater energy density and higher energy efficiency than the unpoled state for memory. The two polarization states produce carrier migrations in opposing directions across the GFNO/STO interface, which alter the depletion region of the device, as reflected in photovoltaic short-circuit current density () values. Modulating the duration (varying the number of sequential pulses but fixing the pulse width and delay time) and direction of continuous pulse voltage is an effective method for controlling , thereby allowing the fabrication of nondestructive, light-tunable, nonvolatile memory devices. In experiments, in the downward polarized state was approximately 6 times greater than that in the upward polarized state. It is promising that more memory states can be enabled by the proposed heterostructure by selecting appropriate pulse trains. Real-time interfacial changes (relative to the nonvolatile characteristics of the device) were obtained by applying synchrotron X-ray techniques simultaneously with pulse characterization. This made it possible to separately probe the electronic and chemical states of the GFNO (a p-type-like semiconductor) and STO (an n-type-like semiconductor) while varying the pulse direction, thereby making it possible to identify the mechanisms underlying the observed phenomena.
本文提出了一种独特的 GdFeNiO 钙钛矿薄膜,用于脉冲控制的非易失性存储器件(与 SrTiO(STO)衬底结合),而无需电应力读取过程。脉冲电压的使用对 GFNO 施加了永久的向下/向上极化状态,与未极化状态相比,这使得存储具有更高的能量密度和更高的能量效率。两种极化状态在 GFNO/STO 界面上产生载流子的相反方向迁移,这改变了器件的耗尽区,如光伏短路电流密度(Jsc)值所示。调制脉冲电压的持续时间(改变连续脉冲的数量,但固定脉冲宽度和延迟时间)和方向是控制 Jsc 的有效方法,从而允许制造非破坏性、可调谐、非易失性的存储器件。在实验中,GFNO 在向下极化状态下的 Jsc 约为向上极化状态下的 6 倍。通过选择适当的脉冲序列,所提出的异质结构有望实现更多的存储状态,这是很有前景的。通过同时应用同步辐射 X 射线技术和脉冲特性,可以获得实时的界面变化(相对于器件的非易失性特性)。这使得可以分别探测 GFNO(p 型半导体)和 STO(n 型半导体)的电子和化学状态,同时改变脉冲方向,从而可以确定观察到的现象的机制。