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单层MoS折纸的纳米压痕

Nanoindentation on Monolayer MoS Kirigami.

作者信息

Wang Beibei, Nakano Aiichiro, Vashishta Priya D, Kalia Rajiv K

机构信息

Collaboratory of Advanced Computing and Simulations, Department of Physics and Astronomy, Mork Family Department of Chemical Engineering and Materials Science, and Department of Computer Science, University of Southern California, Los Angeles, California 90089, United States.

出版信息

ACS Omega. 2019 Jun 7;4(6):9952-9956. doi: 10.1021/acsomega.9b00771. eCollection 2019 Jun 30.

Abstract

Mechanical properties of materials can be altered significantly by the ancient art of kirigami. We study the mechanical properties of atomically thin kirigami membranes of MoS using molecular dynamics simulations. Nanoindentation simulations are performed to study the mechanical response of rectangular and hexagonal kirigami structures. Dramatic changes are observed in the ductility of monolayer kirigami MoS compared with those of a pristine MoS monolayer. Load-displacement curves of kirigami structures exhibit negligible hysteresis, and kirigami structures display remarkable elastic recovery upon unloading. Defects formed at the edges and corners of kirigami structures play an important role in the mechanical response of the membranes.

摘要

材料的机械性能可通过古老的折纸艺术得到显著改变。我们使用分子动力学模拟研究了原子级薄的二硫化钼(MoS)折纸薄膜的机械性能。进行纳米压痕模拟以研究矩形和六边形折纸结构的力学响应。与原始的二硫化钼单层相比,观察到单层二硫化钼折纸的延展性发生了显著变化。折纸结构的载荷-位移曲线显示出可忽略不计的滞后现象,并且折纸结构在卸载后表现出显著的弹性恢复。在折纸结构的边缘和角落形成的缺陷在薄膜的力学响应中起重要作用。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/c3d7/6649064/17b361b2d08e/ao-2019-00771p_0001.jpg

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