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通过量子点配体与硅氧烷基质之间的硅氢化反应改善量子点薄膜的稳定性和分散性

Stability and dispersion improvement of quantum-dot films by hydrosilylation between quantum-dot ligands and a siloxane matrix.

作者信息

Nam Eunhee, Lee Changmin, Kim Sun Jung, Chung Ho Kyoon, Chae Heeyeop

出版信息

Opt Express. 2019 Jul 8;27(14):20037-20046. doi: 10.1364/OE.27.020037.

DOI:10.1364/OE.27.020037
PMID:31503755
Abstract

Quantum-dot (QD) ligands were modified and hydrosilylated with a siloxane matrix to improve the quantum efficiency and stability of the QDs. Conventional oleic acid (OA) ligands were exchanged with vinyl ligands without any reduction in the quantum yield. After ligand modification, hydrosilylation was induced between the vinyl ligands on the QDs (vinyl QDs) and a siloxane matrix, resulting in a uniform QD dispersion in the matrix. The hydrosilylated QDs in siloxane showed 23% higher photoluminescence intensity than OA QDs blended in siloxane after storage for 30 days at 85 °C under 85% relative humidity. The QDs also showed 22.3% higher UV/thermal stability than OA QDs in siloxane after 29 h under a high LED photon flux. This study demonstrates that the chemical reaction of QD ligands with polymer matrices can improve the QDs' dispersion and stability.

摘要

量子点(QD)配体经过修饰,并与硅氧烷基质进行硅氢化反应,以提高量子点的量子效率和稳定性。常规油酸(OA)配体被乙烯基配体取代,量子产率没有任何降低。配体修饰后,量子点上的乙烯基配体(乙烯基量子点)与硅氧烷基质之间发生硅氢化反应,导致量子点在基质中均匀分散。在85%相对湿度下于85°C储存30天后,硅氧烷中的硅氢化量子点的光致发光强度比混合在硅氧烷中的油酸量子点高23%。在高LED光子通量下照射29小时后,量子点在硅氧烷中的紫外线/热稳定性也比油酸量子点高22.3%。这项研究表明,量子点配体与聚合物基质的化学反应可以改善量子点的分散性和稳定性。

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