Madhavan Vinod E, Carignano Marcelo, Kachmar Ali, Sangunni K S
Qatar Environment and Energy Research Institute, Hamad Bin Khalifa University, Qatar Foundation, P. O. Box 34110, Doha, Qatar.
Department of Physics, Indian Institute of Science, Bangalore, 560012, India.
Sci Rep. 2019 Sep 10;9(1):12985. doi: 10.1038/s41598-019-49168-z.
We present the enhanced properties observed in the phase change memory alloy GeSbTe (GST) when doped with arsenic. Although arsenic is known as a toxic element, our observations show that significant improvement can be obtained in GST systems on thermal stability, transition temperature between amorphous and crystalline phases and switching behaviors when doping with arsenic. Though both the GST and arsenic doped GST are amorphous in the as-deposited state, only GST alloy turns to crystalline NaCl-type structure after annealing at 150 °C for 1 h. Results from the resistance versus temperature study show a systematic increase in the transition temperature and resistivity in the amorphous and crystalline states when the arsenic percentage in the GST alloy increases. The crystallization temperature (T) of (GST)As is higher than the T observed in GST. Optical band gap (E) values of the as-deposited films show a clear increasing trend; 0.6 eV for GST to 0.76 eV for (GST)As. The decreases in E for the samples annealed at higher temperatures shows significant optical contrast between the as-deposited and annealed samples. Though all (GST)As alloys show memory switching behaviors, threshold switching voltages (V) of the studied alloys show an increasing trend with arsenic doping. For (GST)As, V is about 5.2 V, which is higher than GST (4.0 V). Higher transition temperature and higher threshold switching values show arsenic doping in GST can enhance the memory device properties by improving the thermal stability and data readability. Understanding the doping effect on the GST is important to understand its crystallization properties. Structure properties of amorphous GST, GeSbAsTe and (GST)As models were studied using first principles molecular dynamics simulations, compared their partial radial distribution functions, and q parameter order. Arsenic doping into GST features interesting structural and electronic effects revealed by the radial distribution functions, q order parameter and band gap value, in line with the experimental findings.
我们展示了在相变存储合金锗锑碲(GST)中掺杂砷时所观察到的增强性能。尽管砷是一种已知的有毒元素,但我们的观察结果表明,在GST体系中,当掺杂砷时,在热稳定性、非晶态与晶态之间的转变温度以及开关行为方面都能获得显著改善。尽管GST和掺杂砷的GST在沉积态均为非晶态,但只有GST合金在150°C退火1小时后转变为晶态的氯化钠型结构。电阻随温度研究的结果表明,当GST合金中的砷含量增加时,非晶态和晶态的转变温度及电阻率会系统性升高。(GST)As的结晶温度(T)高于在GST中观察到的T。沉积态薄膜的光学带隙(E)值呈现出明显的上升趋势;GST为0.6 eV,(GST)As为0.76 eV。较高温度退火样品的E值下降表明沉积态和退火态样品之间存在显著的光学对比度。尽管所有(GST)As合金都表现出记忆开关行为,但所研究合金的阈值开关电压(V)随砷掺杂呈上升趋势。对于(GST)As,V约为5.2 V,高于GST(4.0 V)。更高的转变温度和更高的阈值开关值表明,在GST中掺杂砷可通过提高热稳定性和数据可读性来增强存储器件性能。了解掺杂对GST的影响对于理解其结晶性能很重要。使用第一性原理分子动力学模拟研究了非晶态GST、锗锑砷碲和(GST)As模型的结构特性,比较了它们的部分径向分布函数和q参数有序度。径向分布函数、q有序参数和带隙值揭示了砷掺杂到GST中具有有趣的结构和电子效应,这与实验结果一致。