Mise Yoshihiro, Ahn So-Jin, Takagaki Atsushi, Kikuchi Ryuji, Oyama Shigeo Ted
Department of Chemical System Engineering, the University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8556, Japan.
Department of Chemical Engineering, Virginia Tech, Blacksburg, VA 24061, USA.
Membranes (Basel). 2019 Sep 20;9(10):123. doi: 10.3390/membranes9100123.
Gas separation membranes were fabricated with varying trimethylmethoxysilane(TMMOS)/tetraethoxy orthosilicate (TEOS) ratios by a chemical vapor deposition (CVD) method at650 °C and atmospheric pressure. The membrane had a high H permeance of 8.3 × 10 mol m sPa with H2/CH4 selectivity of 140 and H/CH selectivity of 180 at 300 °C. Fourier transforminfrared (FTIR) measurements indicated existence of methyl groups at high preparationtemperature (650 °C), which led to a higher hydrothermal stability of the TMMOS-derivedmembranes than of a pure TEOS-derived membrane. Temperature-dependence measurements ofthe permeance of various gas species were used to establish a permeation mechanism. It was foundthat smaller species (He, H2, and Ne) followed a solid-state diffusion model while larger species (N,CO, and CH) followed a gas translational diffusion model.
通过化学气相沉积（CVD）法，在650℃和大气压下，以不同的三甲基甲氧基硅烷（TMMOS）/正硅酸四乙酯（TEOS）比例制备了气体分离膜。该膜在300℃时具有8.3×10⁻⁷mol m⁻² s⁻¹ Pa⁻¹的高氢气渗透率，H₂/CH₄选择性为140，H₂/CO₂选择性为180。傅里叶变换红外（FTIR）测量表明，在高制备温度（650℃）下存在甲基，这导致TMMOS衍生的膜比纯TEOS衍生的膜具有更高的水热稳定性。通过对各种气体物种渗透率的温度依赖性测量来建立渗透机制。结果发现，较小的物种（He、H₂和Ne）遵循固态扩散模型，而较大的物种（N₂、CO和CH₄）遵循气体平移扩散模型。
