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一种异质外延生长的沸石膜。

An Hetero-Epitaxially Grown Zeolite Membrane.

作者信息

Jeong Yanghwan, Hong Sungwon, Jang Eunhee, Kim Eunjoo, Baik Hionsuck, Choi Nakwon, Yip Alex C K, Choi Jungkyu

机构信息

Department of Chemical & Biological Engineering, Korea University, Seoul, 02841, Republic of Korea.

Korea Basic Science Institute (KBSI) Seoul Center, Seoul, 02841, Republic of Korea.

出版信息

Angew Chem Int Ed Engl. 2019 Dec 16;58(51):18654-18662. doi: 10.1002/anie.201911164. Epub 2019 Oct 30.

DOI:10.1002/anie.201911164
PMID:31591796
Abstract

The secondary growth methodology to form zeolite membranes has stringent requirements for homogeneous epitaxial intergrowth of the seed layer and limits the number of accessible high-quality zeolite membranes. Despite previous reports on hetero-epitaxial growth, high-performance zeolite membranes have yet to be reported using this approach. Here, the successful hetero-epitaxial growth of highly siliceous ZSM-58 (DDR-type zeolite) films from a SSZ-13 (CHA-type zeolite) seed layer is reported. The resulting membranes show excellent CO perm-selectivities, having maximum CO  /N and CO  /CH separation factors (SFs) as high as about 17 and 279, respectively, at 30 °C. Furthermore, the hybrid membrane maintains the CO perm-selectivity in the presence of water vapor (the third main component in both cases), that is, CO  /N SF of about 14 and CO  /CH SF of about 78, respectively, at 50 °C (a representative temperature of both CO -containing streams).

摘要

用于形成沸石膜的二次生长方法对晶种层的均匀外延共生有严格要求,并且限制了可获得的高质量沸石膜的数量。尽管之前有关于异质外延生长的报道,但尚未有使用这种方法制备高性能沸石膜的相关报道。在此,报道了从SSZ-13(CHA型沸石)晶种层成功实现高硅ZSM-58(DDR型沸石)膜的异质外延生长。所得膜表现出优异的CO渗透选择性,在30°C时,最大CO /N和CO /CH分离因子(SFs)分别高达约17和279。此外,该混合膜在有水蒸气(两种情况下的第三种主要成分)存在时仍保持CO渗透选择性,即在50°C(含CO物流的代表性温度)时,CO /N SF约为14,CO /CH SF约为78。

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