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利用高分辨扫描隧道显微镜(HP-STM)和常压X射线光电子能谱(AP-XPS)对固-气气氛下界面结构进行原位表征的研究进展

Recent Progress with In Situ Characterization of Interfacial Structures under a Solid-Gas Atmosphere by HP-STM and AP-XPS.

作者信息

Zhang Huan, Sun Haoliang, Shen Kongchao, Hu Jinping, Hu Jinbang, Jiang Zheng, Song Fei

机构信息

Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201800, China.

University of Chinese Academy of Sciences, Beijing 101000, China.

出版信息

Materials (Basel). 2019 Nov 7;12(22):3674. doi: 10.3390/ma12223674.

DOI:10.3390/ma12223674
PMID:31703436
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC6888168/
Abstract

Surface science is an interdisciplinary field involving various subjects such as physics, chemistry, materials, biology and so on, and it plays an increasingly momentous role in both fundamental research and industrial applications. Despite the encouraging progress in characterizing surface/interface nanostructures with atomic and orbital precision under ultra-high-vacuum (UHV) conditions, investigating in situ reactions/processes occurring at the surface/interface under operando conditions becomes a crucial challenge in the field of surface catalysis and surface electrochemistry. Promoted by such pressing demands, high-pressure scanning tunneling microscopy (HP-STM) and ambient pressure X-ray photoelectron spectroscopy (AP-XPS), for example, have been designed to conduct measurements under operando conditions on the basis of conventional scanning tunneling microscopy (STM) and photoemission spectroscopy, which are proving to become powerful techniques to study various heterogeneous catalytic reactions on the surface. This report reviews the development of HP-STM and AP-XPS facilities and the application of HP-STM and AP-XPS on fine investigations of heterogeneous catalytic reactions via evolutions of both surface morphology and electronic structures, including dehydrogenation, CO oxidation on metal-based substrates, and so on. In the end, a perspective is also given regarding the combination of in situ X-ray photoelectron spectroscopy (XPS) and STM towards the identification of the structure-performance relationship.

摘要

表面科学是一个涉及物理、化学、材料、生物学等多学科的领域,在基础研究和工业应用中都发挥着越来越重要的作用。尽管在超高真空(UHV)条件下以原子和轨道精度表征表面/界面纳米结构方面取得了令人鼓舞的进展,但在实际操作条件下研究表面/界面发生的原位反应/过程已成为表面催化和表面电化学领域的一项关键挑战。在这种迫切需求的推动下,例如高压扫描隧道显微镜(HP-STM)和常压X射线光电子能谱(AP-XPS),已在传统扫描隧道显微镜(STM)和光发射光谱的基础上设计用于在实际操作条件下进行测量,事实证明这些技术已成为研究表面各种多相催化反应的强大工具。本报告回顾了HP-STM和AP-XPS设备的发展以及HP-STM和AP-XPS通过表面形貌和电子结构的演变对多相催化反应进行精细研究的应用,包括脱氢、金属基衬底上的CO氧化等。最后,还对原位X射线光电子能谱(XPS)和STM相结合以确定结构-性能关系给出了展望。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/59e0/6888168/9d1fb6c3f221/materials-12-03674-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/59e0/6888168/377432655b54/materials-12-03674-sch002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/59e0/6888168/bebb8f4eade4/materials-12-03674-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/59e0/6888168/9d1fb6c3f221/materials-12-03674-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/59e0/6888168/377432655b54/materials-12-03674-sch002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/59e0/6888168/bebb8f4eade4/materials-12-03674-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/59e0/6888168/9d1fb6c3f221/materials-12-03674-g003.jpg

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