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原子力声学显微镜研究 SU-8 光刻胶的交联过程。

Study of SU-8 photoresist cross-linking process by atomic force acoustic microscopy.

机构信息

Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun, China.

International Research Centre for Nano Handling and Manufacturing of China, Changchun University of Science and Technology, Changchun, China.

出版信息

J Microsc. 2019 Dec;276(3):136-144. doi: 10.1111/jmi.12848. Epub 2019 Dec 2.

DOI:10.1111/jmi.12848
PMID:31769508
Abstract

In this paper, a method is presented to detect the different phases of epoxy cross-linking process and the subsurface structures of SU-8 thin films by atomic force acoustic microscopy (AFAM). The AFAM imaging of SU-8 thin films was investigated under different exposure and bake conditions. Optimized conditions were obtained for the cross-linking of SU-8 thin film at the exposure does of eight laser pulses with the laser fluence 10 mJ cm per pulse and the post exposure bake (PEB) time at 90 s. The subsurface structures of undeveloped SU-8 thin films were visible in the AFAM images. This method provides an effective and low-cost way for the determination of different phases of epoxy cross-linking process in nanostructured compounds, for the non-destructive testing of subsurface defects, and for the evaluation of the quality of patterned structures.

摘要

本文提出了一种通过原子力声显微镜(AFAM)检测环氧树脂交联过程不同阶段和 SU-8 薄膜亚表面结构的方法。研究了不同曝光和烘烤条件下 SU-8 薄膜的 AFAM 成像。在激光能量密度为 10mJ/cm2、曝光剂量为 8 个激光脉冲的条件下,获得了 SU-8 薄膜交联的最佳条件,后曝光烘烤(PEB)时间为 90s。在 AFAM 图像中可以看到未显影的 SU-8 薄膜的亚表面结构。该方法为确定纳米结构化合物中环氧树脂交联过程的不同阶段、亚表面缺陷的无损检测以及图案化结构质量的评估提供了一种有效且低成本的方法。

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