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双层石墨烯中层间位错的形成与发展的分子动力学模拟。

Molecular dynamics simulation on the formation and development of interlayer dislocations in bilayer graphene.

机构信息

State Key Laboratory of Structural Analysis for Industrial Equipment, School of Aeronautics and Astronautics, Dalian University of Technology, Dalian, People's Republic of China. Key Laboratory of Advanced Technology for Aerospace Vehicles, Liaoning Province, People's Republic of China.

出版信息

Nanotechnology. 2020 Mar 20;31(12):125704. doi: 10.1088/1361-6528/ab5c7e. Epub 2019 Nov 27.

DOI:10.1088/1361-6528/ab5c7e
PMID:31775124
Abstract

Molecular dynamics simulations are used to study the formation and development of interlayer dislocations in bilayer graphene (BLG) subjected to uniaxial tension. Two different BLGs are employed for the simulation: armchair (AC-BLG) and zigzag (ZZ-BLG). The atomic-level strains are calculated and the parameter 'dislocation intensity' is introduced to identify the dislocations. The interlayer dislocation is found to start at the edge and propagate to the center. For AC-BLG, the dislocations arise successively with the increase of applied strain, and all dislocations have the same width. For ZZ-BLG, the first dislocation arises alone. After that, two dislocations with different widths appear together every time. The simulated dislocation widths are in good agreement with existing experimental results. Across every dislocation, there is a transition from AB stacking to AC stacking, or vice versa. When temperature is taken into account, the dislocation boundaries become indistinct and the formation of dislocations is postponed due to the existence of dispersive small slippages. Due to the disturbance of temperature, dislocations present reciprocating movement. These findings contribute to the understanding of interlayer dislocations in two-dimensional materials, and will enable the exploration of many more strain related fundamental science problems and application challenges.

摘要

采用分子动力学模拟研究了在单向拉伸作用下双层石墨烯(BLG)中层间位错的形成和发展。模拟采用了两种不同的 BLG:扶手椅型(AC-BLG)和锯齿型(ZZ-BLG)。计算了原子级应变,并引入了参数“位错密度”来识别位错。发现层间位错从边缘开始并向中心扩展。对于 AC-BLG,随着外加应变的增加,位错依次出现,且所有位错的宽度相同。对于 ZZ-BLG,首先单独出现一个位错。之后,每次都会同时出现两个宽度不同的位错。模拟的位错宽度与现有的实验结果吻合较好。在每个位错处,都存在从 AB 堆垛到 AC 堆垛的转变,或者相反。考虑到温度的影响,由于存在弥散的小滑移,位错边界变得不明显,位错的形成被推迟。由于温度的干扰,位错呈现往复运动。这些发现有助于理解二维材料中的层间位错,并将能够探索更多与应变相关的基础科学问题和应用挑战。

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