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采用P3CT-Rb作为空穴传输层的高效倒置钙钛矿太阳能电池,实现了1.144 V的大开路电压。

Highly efficient inverted perovskite solar cells incorporating P3CT-Rb as a hole transport layer to achieve a large open circuit voltage of 1.144 V.

作者信息

Li Shufang, He Bizu, Xu Jing, Lu Huiqiang, Jiang Jian, Zhu Jianhui, Kan Zhipeng, Zhu Linna, Wu Fei

机构信息

Chongqing Key Laboratory for Advanced Materials and Technologies of Clean Energy, School of Materials & Energy, Southwest University, Chongqing 400715, P. R. China.

School of Physical Science and Technology, Southwest University, Chongqing 400715, P. R. China.

出版信息

Nanoscale. 2020 Feb 14;12(6):3686-3691. doi: 10.1039/c9nr08441j. Epub 2020 Feb 4.

DOI:10.1039/c9nr08441j
PMID:32016197
Abstract

Poly[3-(4-carboxybutyl)thiophene-2,5-diyl] (P3CT) has been noticed as a promising hole transport layer (HTL) for high-performance inverted planar perovskite solar cells (PSCs) due to its excellent stability and relatively high hole mobility. As we all know, the morphology of perovskite films is largely influenced by the substrate materials. Considering the affinity of alkali metal ions Rb and Cs with perovskite materials, inverted perovskite solar cells using alkali metal ion (Rb, Cs) doped P3CT (denoted as P3CT-Rb and P3CT-Cs) as the HTLs were investigated in this work. It turned out that the work function (WF) of P3CT-Rb matches well with the valence band of perovskites. The perovskite (MAPbICl) film deposited on top of the P3CT-Rb film exhibited a dense and uniform morphology with superior crystallinity and few pinholes. Consequently, a high efficiency of 20.52% was achieved for P3CT-Rb HTL-based devices, with an impressive open-circuit voltage (V) of 1.144 V and a high fill factor (FF) of 82.78%.

摘要

聚3-(4-羧基丁基)噻吩-2,5-二亚基因其优异的稳定性和相对较高的空穴迁移率,已被视为高性能倒置平面钙钛矿太阳能电池(PSC)的一种有前途的空穴传输层(HTL)。众所周知,钙钛矿薄膜的形貌在很大程度上受衬底材料的影响。考虑到碱金属离子Rb和Cs与钙钛矿材料的亲和性,本工作研究了使用碱金属离子(Rb、Cs)掺杂的P3CT(表示为P3CT-Rb和P3CT-Cs)作为HTL的倒置钙钛矿太阳能电池。结果表明,P3CT-Rb的功函数(WF)与钙钛矿的价带匹配良好。沉积在P3CT-Rb薄膜顶部的钙钛矿(MAPbICl)薄膜呈现出致密且均匀的形貌,具有优异的结晶度且几乎没有针孔。因此,基于P3CT-Rb HTL的器件实现了20.52%的高效率,开路电压(V)高达1.144 V,填充因子(FF)高达82.78%。

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