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受蓝尾林鹰蜻蜓翅膀上倾斜锥形结构启发的可逆擦除宽带全向减反射涂层

Reversibly Erasable Broadband Omnidirectional Antireflection Coatings Inspired by Inclined Conical Structures on Blue-Tailed Forest Hawk Dragonfly Wings.

作者信息

Tseng Hsin-Yu, Chen Yu-Han, Chen Ru-Yu, Yang Hongta

机构信息

Department of Chemical Engineering, National Chung Hsing University, 145 Xingda Road, Taichung City 40227, Taiwan.

出版信息

ACS Appl Mater Interfaces. 2020 Mar 4;12(9):10883-10892. doi: 10.1021/acsami.0c00823. Epub 2020 Feb 18.

Abstract

Blue-tailed forest hawk dragonfly () wings, covered with inclined conical structures, are studied for their high transparency and low reflectance for large viewing angles. However, limited by existing technologies, the exquisite inclined structures are not replicated easily or applied adequately. Here, we combine a shear-induced self-assembly approach and a colloidal lithography technology to create omnidirectional antireflection structures that are inspired by dragonfly wings. Nonclose-packed colloid crystals are spin-coated and serve as structural templates in a plasma etching procedure to pattern subwavelength inclined conical structures directly on shape memory polymer-coated substrates. The dependence of the antireflection functionality on the shape and inclination of conical structures is systematically investigated in this research. Compared with a featureless substrate, the structure-covered substrate can display an approximately 8% higher average transmittance in the visible wavelength range at normal incidence and even approximately 23% higher average transmittance as the incident angle increases to 75°. Moreover, the reconfigurable structures composed of shape memory polymers can be repeatedly deformed and recovered as a result of external stimuli at ambient conditions, and the corresponding broadband omnidirectional antireflection functionality is therefore reversibly erased and restored.

摘要

蓝尾林鹰蜻蜓()翅膀上覆盖着倾斜的锥形结构,因其在大视角下具有高透明度和低反射率而受到研究。然而,受现有技术限制,这种精致的倾斜结构不易复制或充分应用。在此,我们将剪切诱导自组装方法与胶体光刻技术相结合,以制造受蜻蜓翅膀启发的全向抗反射结构。通过旋涂非密堆积胶体晶体,并在等离子体蚀刻过程中将其用作结构模板,从而在形状记忆聚合物涂层基板上直接形成亚波长倾斜锥形结构。本研究系统地研究了抗反射功能对锥形结构形状和倾斜度的依赖性。与无特征基板相比,覆盖有结构的基板在垂直入射时在可见波长范围内的平均透过率可提高约8%,而当入射角增加到75°时,平均透过率甚至可提高约23%。此外,由形状记忆聚合物组成的可重构结构在环境条件下由于外部刺激可反复变形和恢复,因此相应的宽带全向抗反射功能也可被可逆地消除和恢复。

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