Yu Jaehyung, Kim SunPhil, Ertekin Elif, van der Zande Arend M
Department of Mechanical Science and Engineering, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, United States.
Materials Research Laboratory, University of Illinois at Urbana-Champaign, 104 S Goodwin Avenue MC-230, Urbana, Illinois 61801, United States.
ACS Appl Mater Interfaces. 2020 Mar 4;12(9):10801-10808. doi: 10.1021/acsami.9b20909. Epub 2020 Feb 20.
Inducing and controlling three-dimensional deformations in monolayer two-dimensional materials is important for applications from stretchable electronics to origami nanoelectromechanical systems. For these applications, it is critical to understand how the properties of different materials influence the morphologies of two-dimensional atomic membranes under mechanical loading. Here, we systematically investigate the evolution of mechanical folding instabilities in uniaxially compressed monolayer graphene and MoS on a soft polydimethylsiloxane substrate. We examine the morphology of the compressed membranes using atomic force microscopy for compression from 0 to 33%. We find the membranes display roughly evenly spaced folds and observe two distinct stress release mechanisms under increasing compression. At low compression, the membranes delaminate to generate new folds. At higher compression, the membranes slip over the surface to enlarge existing folds. We observe a material-dependent transition between these two behaviors at a critical fold spacing of 1000 ± 250 nm for graphene and 550 ± 20 nm for MoS. We establish a simple shear-lag model which attributes the transition to a competition between static friction and adhesion and gives the maximum interfacial static friction on polydimethylsiloxane of 3.8 ± 0.8 MPa for graphene and 7.7 ± 2.5 MPa for MoS. Furthermore, in graphene, we observe an additional transition from standing folds to fallen folds at 8.5 ± 2.3 nm fold height. These results provide a framework to control the nanoscale fold structure of monolayer atomic membranes, which is a critical step in deterministically designing stretchable or foldable nanosystems based on two-dimensional materials.
在单层二维材料中诱导和控制三维变形对于从可拉伸电子器件到折纸纳米机电系统等应用至关重要。对于这些应用而言,了解不同材料的特性如何在机械载荷下影响二维原子膜的形态至关重要。在此,我们系统地研究了在柔软的聚二甲基硅氧烷衬底上单向压缩的单层石墨烯和二硫化钼中机械折叠不稳定性的演变。我们使用原子力显微镜检查压缩至0%到33%的压缩膜的形态。我们发现这些膜呈现出大致均匀间隔的褶皱,并观察到在压缩增加时两种不同的应力释放机制。在低压缩时,膜分层以产生新的褶皱。在较高压缩时,膜在表面上滑动以扩大现有的褶皱。我们观察到,对于石墨烯,在临界褶皱间距为1000±250纳米时,对于二硫化钼,在临界褶皱间距为550±20纳米时,这两种行为之间存在材料依赖性转变。我们建立了一个简单的剪滞模型,将这种转变归因于静摩擦力和附着力之间的竞争,并得出石墨烯在聚二甲基硅氧烷上的最大界面静摩擦力为3.8±0.8兆帕,二硫化钼为7.7±2.5兆帕。此外,在石墨烯中,我们在褶皱高度为8.5±2.3纳米时观察到从直立褶皱到倒伏褶皱的额外转变。这些结果提供了一个控制单层原子膜纳米级褶皱结构的框架,这是基于二维材料确定性设计可拉伸或可折叠纳米系统的关键一步。