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缺陷工程化金属有机框架材料的原位合成作为一种光再生催化吸附剂:了解配体-金属-配体(LML)的影响、吸附行为和光反应过程。

In Situ Synthesis of Defect-Engineered MOFs as a Photoregenerable Catalytic Adsorbent: Understanding the Effect of LML, Adsorption Behavior, and Photoreaction Process.

作者信息

Gao Yanxin, Lu Jiong, Xia Jing, Yu Gang

机构信息

Beijing Key Laboratory for Emerging Organic Contaminants Control, State Key Joint Laboratory of Environment Simulation and Pollution Control (SKLESPC), School of Environment, Tsinghua University, Beijing 100084, China.

出版信息

ACS Appl Mater Interfaces. 2020 Mar 18;12(11):12706-12716. doi: 10.1021/acsami.9b21122. Epub 2020 Mar 9.

Abstract

Defect-engineering is an exciting strategy for the modification of metal-organic frameworks (MOFs), which can go beyond the limit of conventional MOFs, tailor material properties, and incorporate multiple functionalities. Herein, based on the large mixed-linker approach, we successfully integrated tetrakis(4-carboxyphenyl)porphyrin (TCPP) into stable UiO-66 via an in situ one-pot synthetic method and used the obtained material for the removal of diclofenac (DF). TCPP@UiO-66 maintained the structure, excellent stability, and porosity of UiO-66. The defect density significantly affected the phase purity, crystallite morphology, and properties of TCPP@UiO-66s. Owing to the delicate balance between defects, stability, and porosity, TCPP@UiO-66(25%) was the optimal material in our system. The pseudo-second-order kinetic model and the Sips isothermal model described the adsorption of DF onto defect-engineered MOFs, and the adsorption capacity was 590 mg/g. Electrostatic interaction, Lewis acid-base interaction, π-π interaction, hydrogen bonding, and anion-π interaction were possible adsorption mechanisms. Moreover, under simulated sunlight irradiation, TCPP@UiO-66(25%) was catalytically active for the degradation of DF with a removal efficiency of 99%. It displayed good recyclability during three reaction cycles. The result of electron spin resonance revealed the generation of O, implying the occurrence of type II photosensitization reaction. Meanwhile, the first-order rate constants of DF photodegradation after the addition of scavengers confirmed that h is also a key reactive species. Both the energy transfer from TCPP to triplet oxygen and the electron transfer from TCPP to Zr clusters contributed to the degradation of DF. The degradation byproducts of DF were monitored by three-dimensional excitation-emission matrix (3D EEM). Therefore, TCPP@UiO-66(25%) was an attractive photoregenerable catalytic adsorbent for the effective removal of DF. Combining the advantages of the parent framework and the functional linker, our strategy expands the functionality of the stable MOFs for potential applications in environmental remediation.

摘要

缺陷工程是一种用于修饰金属有机框架(MOF)的令人兴奋的策略,它可以突破传统MOF的限制,定制材料性能,并融入多种功能。在此,基于大混合连接体方法,我们通过原位一锅合成法成功地将四(4-羧基苯基)卟啉(TCPP)整合到稳定的UiO-66中,并将所得材料用于去除双氯芬酸(DF)。TCPP@UiO-66保持了UiO-66的结构、优异的稳定性和孔隙率。缺陷密度显著影响了TCPP@UiO-66s的相纯度、微晶形态和性能。由于缺陷、稳定性和孔隙率之间的微妙平衡,TCPP@UiO-66(25%)是我们体系中的最佳材料。准二级动力学模型和Sips等温模型描述了DF在缺陷工程MOF上的吸附,吸附容量为590 mg/g。静电相互作用、路易斯酸碱相互作用、π-π相互作用、氢键和阴离子-π相互作用是可能的吸附机制。此外,在模拟阳光照射下,TCPP@UiO-66(25%)对DF的降解具有催化活性,去除效率为99%。在三个反应循环中,它表现出良好的可回收性。电子自旋共振结果揭示了O的产生,这意味着发生了II型光敏化反应。同时,添加清除剂后DF光降解的一级速率常数证实h也是关键的反应物种。从TCPP到三线态氧的能量转移以及从TCPP到Zr簇的电子转移都有助于DF的降解。通过三维激发-发射矩阵(3D EEM)监测DF的降解副产物。因此,TCPP@UiO-66(25%)是一种有吸引力的光可再生催化吸附剂,可有效去除DF。结合母体框架和功能连接体的优点,我们的策略扩展了稳定MOF在环境修复潜在应用中的功能。

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