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用于低挥发性前驱体的蒸汽抽取安瓿的基于实验的建模。

Experiment-based modelling of a vapor draw ampoule used for low-volatility precursors.

作者信息

Sperling Brent A, Maslar James E

机构信息

Material Measurement Laboratory, National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, MD 20899, USA.

出版信息

J Vac Sci Technol B Nanotechnol Microelectron. 2019;37(6). doi: 10.1116/1.5125446.

DOI:10.1116/1.5125446
PMID:32128289
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC7053647/
Abstract

Delivery of low-volatility precursors is a continuing challenge for chemical vapor deposition and atomic layer deposition processes used for microelectronics manufacturing. To aid in addressing this problem, we have recently developed an inline measurement capable of monitoring precursor delivery. Motivated by a desire to better understand the origins of what is now observable, this study uses computational fluid dynamics and a relatively simple model to simulate the delivery of pentakis(dimethylamido)tantalum (PDMAT) from a commercial vapor draw ampoule. Parameters used in the model are obtained by fitting the performance of the ampoule to a limited dataset of PDMAT delivery rates obtained experimentally using a non-dispersive infrared sensor. The model shows good agreement with a much larger experimental dataset over a range of conditions in both pulsed and continuously flowing operation. The combined approach of experiment and simulation provides a means to understand the phenomena occurring during precursor delivery both quantitatively and qualitatively.

摘要

对于用于微电子制造的化学气相沉积和原子层沉积工艺而言,输送低挥发性前驱体一直是一项挑战。为了帮助解决这一问题,我们最近开发了一种能够监测前驱体输送的在线测量方法。出于更好地理解当前可观测现象起源的愿望,本研究使用计算流体动力学和一个相对简单的模型来模拟从商用蒸汽抽取安瓿中输送五(二甲基氨基)钽(PDMAT)的过程。模型中使用的参数是通过将安瓿的性能与使用非色散红外传感器实验获得的有限PDMAT输送速率数据集进行拟合而得到的。该模型在脉冲操作和连续流动操作的一系列条件下,与一个大得多的实验数据集显示出良好的一致性。实验与模拟相结合的方法提供了一种定量和定性理解前驱体输送过程中发生现象的手段。

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本文引用的文献

1
Characterization of bubbler performance for low-volatility liquid precursor delivery.用于低挥发性液体前驱体输送的鼓泡器性能表征。
J Vac Sci Technol A. 2019;37(4). doi: 10.1116/1.5099264.
2
Apparatus for Characterizing Gas-Phase Chemical Precursor Delivery for Thin Film Deposition Processes.用于表征薄膜沉积工艺中气相化学前驱体输送的装置。
J Res Natl Inst Stand Technol. 2019 Mar 26;124:1-15. doi: 10.6028/jres.124.005. eCollection 2019.
3
Nondispersive Infrared Gas Analyzer for Partial Pressure Measurements of a Tantalum Alkylamide During Vapor Deposition Processes.
用于在气相沉积过程中测量烷基酰胺钽分压的非色散红外气体分析仪。
Appl Spectrosc. 2020 Oct;74(10):1219-1229. doi: 10.1177/0003702819885182. Epub 2020 Aug 24.
4
Nondispersive Infrared Gas Analyzer for Vapor Density Measurements of a Carbonyl-Containing Organometallic Cobalt Precursor.用于含羰基有机金属钴前驱体蒸汽密度测量的非色散红外气体分析仪。
Appl Spectrosc. 2017 Dec;71(12):2632-2642. doi: 10.1177/0003702817716939. Epub 2017 Jul 14.
5
Direct-Liquid-Evaporation Chemical Vapor Deposition of Nanocrystalline Cobalt Metal for Nanoscale Copper Interconnect Encapsulation.直接液-相蒸发化学气相沉积法制备用于纳米尺度铜互连封装的纳米晶钴金属
ACS Appl Mater Interfaces. 2017 Mar 29;9(12):10914-10920. doi: 10.1021/acsami.7b01327. Epub 2017 Mar 16.
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Correcting "static" measurements of vapor pressure for time dependence due to diffusion and decomposition.校正由于扩散和分解导致的蒸气压“静态”测量值随时间的变化。
J Chem Eng Data. 2015 Dec 10;60(12):3496-3505. doi: 10.1021/acs.jced.5b00752. Epub 2015 Nov 17.
7
Apparatus to measure the vapor pressure of slowly decomposing compounds from 1 Pa to 10 Pa.用于测量从1帕斯卡到10帕斯卡缓慢分解化合物蒸气压的仪器。
J Chem Eng Data. 2015 Nov;60(12):3483-3495. doi: 10.1021/acs.jced.5b00751. Epub 2015 Nov 17.