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基于聚偏氟乙烯的复合薄膜的旋涂与微图案化优化

Spin Coating and Micro-Patterning Optimization of Composite Thin Films Based on PVDF.

作者信息

Nguyen Anh Ngoc, Solard Jeanne, Nong Huyen Thi Thanh, Ben Osman Chirine, Gomez Andres, Bockelée Valérie, Tencé-Girault Sylvie, Schoenstein Frédéric, Simón-Sorbed Maite, Carrillo Anna Esther, Mercone Silvana

机构信息

Laboratoire de Sciences des Procédés et des Matériaux (LSPM-CNRS UPR-3407), Université Sorbonne Paris Nord (USPN), 93430 Villetaneuse, France.

Institute of Materials Science, Vietnam Academy of Science and Technology, Cau Giay Distr., Hanoi, Vietnam.

出版信息

Materials (Basel). 2020 Mar 16;13(6):1342. doi: 10.3390/ma13061342.

Abstract

We optimize the elaboration of very thin film of poly(vinylidene fluoride) (PVDF) polymer presenting a well-controlled thickness, roughness, and nano-inclusions amount. We focused our effort on the spin coating elaboration technique which is easy to transfer to an industrial process. We show that it is possible to obtain continuous and smooth thin films with mean thicknesses of 90 nm by properly adjusting the concentration and the viscosity of the PVDF solution as well as the spin rate and the substrate temperature of the elaboration process. The electro-active phase content versus the magnetic and structural properties of the composite films is reported and fully discussed. Last but not least, micro-patterning optical lithography combined with plasma etching has been used to obtain well-defined one-dimensional micro-stripes as well as squared-rings, demonstrating the easy-to-transfer silicon technology to polymer-based devices.

摘要

我们优化了聚偏氟乙烯(PVDF)聚合物超薄膜的制备工艺,使其厚度、粗糙度和纳米夹杂物含量得到良好控制。我们将精力集中在旋涂制备技术上,该技术易于转化为工业生产工艺。我们表明,通过适当调整PVDF溶液的浓度和粘度以及制备过程中的旋转速率和基板温度,可以获得平均厚度为90nm的连续且光滑的薄膜。报告并充分讨论了复合薄膜的电活性相含量与磁性和结构性能的关系。最后但同样重要的是,微图案光刻与等离子体蚀刻相结合已被用于获得轮廓清晰的一维微条纹以及方环,这证明了将硅技术轻松转移到聚合物基器件上的可行性。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ecc8/7143455/380a8a4db37f/materials-13-01342-g0A1.jpg

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