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用于提升二维半导体光伏异质结光电性能的整体界面接触工程

Monolithic Interface Contact Engineering to Boost Optoelectronic Performances of 2D Semiconductor Photovoltaic Heterojunctions.

作者信息

Yang Seunghoon, Cha Janghwan, Kim Jong Chan, Lee Donghun, Huh Woong, Kim Yoonseok, Lee Seong Won, Park Hong-Gyu, Jeong Hu Young, Hong Suklyun, Lee Gwan-Hyoung, Lee Chul-Ho

机构信息

KU-KIST Graduate School of Converging Science and Technology, Korea University, 145 Anam-ro, Seongbuk-gu, Seoul 02841, Republic of Korea.

Department of Physics, Graphene Research Institute, and GRI-TPC International Research Center, Sejong University, Seoul 05006, Republic of Korea.

出版信息

Nano Lett. 2020 Apr 8;20(4):2443-2451. doi: 10.1021/acs.nanolett.9b05162. Epub 2020 Mar 24.

DOI:10.1021/acs.nanolett.9b05162
PMID:32191480
Abstract

In optoelectronic devices based on two-dimensional (2D) semiconductor heterojunctions, the efficient charge transport of photogenerated carriers across the interface is a critical factor to determine the device performances. Here, we report an unexplored approach to boost the optoelectronic device performances of the WSe-MoS - heterojunctions via the monolithic-oxidation-induced doping and resultant modulation of the interface band alignment. In the proposed device, the atomically thin WO layer, which is directly formed by layer-by-layer oxidation of WSe, is used as a charge transport layer for promoting hole extraction. The use of the ultrathin oxide layer significantly enhanced the photoresponsivity of the WSe-MoS - junction devices, and the power conversion efficiency increased from 0.7 to 5.0%, maintaining the response time. The enhanced characteristics can be understood by the formation of the low Schottky barrier and favorable interface band alignment, as confirmed by band alignment analyses and first-principle calculations. Our work suggests a new route to achieve interface contact engineering in the heterostructures toward realizing high-performance 2D optoelectronics.

摘要

在基于二维(2D)半导体异质结的光电器件中,光生载流子在界面上的高效电荷传输是决定器件性能的关键因素。在此,我们报告一种未被探索的方法,即通过整体氧化诱导掺杂以及由此产生的界面能带排列调制来提高WSe-MoS - 异质结的光电器件性能。在所提出的器件中,通过WSe的逐层氧化直接形成的原子级薄WO层用作促进空穴提取的电荷传输层。超薄氧化层的使用显著提高了WSe-MoS - 结器件的光响应性,功率转换效率从0.7%提高到5.0%,同时保持了响应时间。能带排列分析和第一性原理计算证实,低肖特基势垒的形成和良好的界面能带排列可以解释这些增强的特性。我们的工作为在异质结构中实现界面接触工程以实现高性能二维光电子学提供了一条新途径。

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