Ye Feihong, Wu Tianyu, Zhu Ziqiang, Chen Zhiliang, Wang Haibing, Liang Jiwei, Xiao Meng, Tao Chen, Fang Guojia
Key Lab of Artificial Micro- and Nano-Structures of Ministry of Education of China, School of Physics and Technology, Wuhan University, Wuhan 430072, People's Republic of China. Shenzhen Institute, Wuhan University, Shenzhen 518055, People's Republic of China.
Nanotechnology. 2020 Apr 17;31(27):275407. doi: 10.1088/1361-6528/ab81c8. Epub 2020 Mar 20.
Antireflection (AR) film is a widely used technology to enhance the performance of photovoltaic devices that require transparent electrodes in the photovoltaic industry. At present, several AR films including monolayer MgF or multilayered composite films, textured polydimethylsiloxane (PDMS) and porous SiO have been successfully applied due to their excellent properties. Nevertheless, all of the above-mentioned AR films have some minor drawbacks to overcome, for instance, the cost or thermal durability. Herein, we report a cost-effective and low-temperature method to fabricate a mesoporous aluminum oxide (meso-AlO) layer as the AR coating with high thermal durability, which will meet the fabrication condition of various photovoltaic devices. Briefly, the process begins at magnetron sputtering a compact AlO film, which shows no AR effect, followed by a hot water treatment at 80 °C to turn the compact film into a mesoporous film with graded-index and AR effect. The application of meso-AlO AR film enhances the maximum transmittance of our laboratory-used fluorine-doped tin oxide (FTO) from 84% to 89%, which is in good agreement with our theoretical simulation named graded-index approximation. Taking perovskite solar cells (PSCs) as an example, planar PSCs with meso-AlO AR film deliver excellent photon conversion efficiency of 21.5%, which is higher than that of cells without meso-AlO AR film (20.9%).
减反射（AR）膜是光伏行业中一种广泛应用的技术，用于提高需要透明电极的光电器件的性能。目前，包括单层MgF或多层复合膜、纹理化聚二甲基硅氧烷（PDMS）和多孔SiO在内的几种AR膜因其优异的性能已成功应用。然而，上述所有AR膜都有一些小缺点需要克服，例如成本或热耐久性。在此，我们报告一种经济高效的低温方法来制备介孔氧化铝（meso-AlO）层作为具有高热耐久性的AR涂层，这将满足各种光电器件的制造条件。简而言之，该过程始于磁控溅射一层致密的AlO膜，该膜没有减反射效果，随后在80°C下进行热水处理，将致密膜转变为具有渐变折射率和减反射效果的介孔膜。介孔AlO AR膜的应用将我们实验室使用的氟掺杂氧化锡（FTO）的最大透过率从84%提高到89%，这与我们名为渐变折射率近似的理论模拟结果高度一致。以钙钛矿太阳能电池（PSC）为例，带有介孔AlO AR膜的平面PSC具有21.5%的优异光子转换效率，高于没有介孔AlO AR膜的电池（2则0.9%）。
