Ge Chang, Cretu Edmond
Department of Electrical and Computer Engineering, University of British Columbia; 3063-2332 Main Mall, Vancouver, BC V6T 1Z4, Canada.
Micromachines (Basel). 2020 Mar 18;11(3):317. doi: 10.3390/mi11030317.
In this paper, a simple fabrication process for SU-8 in-plane micro electro-mechanical systems (MEMS) structures, called "border-bulk micromachining", is introduced. It aims to enhance the potential of SU-8 MEMS structures for applications such as low-cost/disposable microsystems and wearable MEMS. The fabrication process is robust and uses only four processing steps to fabricate SU-8 in-plane MEMS structures, simplifying the fabrication flow in comparison with other reported attempts. The whole fabrication process has been implemented on copper-polyimide composites. A new processing method enables the direct, laser-based micromachining of polyimide in a practical way, bringing in extra processing safety and simplicity. After forming the polymeric in-plane MEMS structures through SU-8 lithography, a copper wet etching masked by the SU-8 structure layers is carried out. After the wet etching, fabricated in-plane MEMS structures are suspended within an open window on the substrate, similar to the final status of in-plane MEMS devices made from industrial silicon micromachining methods (such as SOIMUMPS). The last step of the fabrication flow is a magnetron sputtering of aluminum. The border-bulk micromachining process has been experimentally evaluated through the fabrication and the characterization of simple in-plane electrically actuated MEMS test structures. The characterization results of these simple test structures have verified the following process qualities: controllability, reproducibility, predictability and general robustness.
本文介绍了一种用于SU-8平面微机电系统(MEMS)结构的简单制造工艺,称为“边界-体微加工”。其目的是增强SU-8 MEMS结构在低成本/一次性微系统和可穿戴MEMS等应用中的潜力。该制造工艺稳健,仅使用四个加工步骤来制造SU-8平面MEMS结构,与其他已报道的尝试相比简化了制造流程。整个制造工艺已在铜-聚酰亚胺复合材料上实现。一种新的加工方法能够以实用的方式对聚酰亚胺进行直接的基于激光的微加工,带来额外的加工安全性和简便性。通过SU-8光刻形成聚合物平面MEMS结构后,进行由SU-8结构层掩膜的铜湿法蚀刻。湿法蚀刻后,制造的平面MEMS结构悬浮在基板上的开口窗口内,类似于由工业硅微加工方法(如SOIMUMPS)制成的平面MEMS器件的最终状态。制造流程的最后一步是铝的磁控溅射。通过制造和表征简单的平面电驱动MEMS测试结构,对边界-体微加工工艺进行了实验评估。这些简单测试结构的表征结果验证了以下工艺特性:可控性、可重复性、可预测性和总体稳健性。