Bouchet Dorian, Carminati Rémi, Mosk Allard P
Nanophotonics, Debye Institute for Nanomaterials Science, Utrecht University, P.O. Box 80000, 3508 TA Utrecht, Netherlands.
Institut Langevin, ESPCI Paris, PSL University, CNRS, 1 rue Jussieu, 75005 Paris, France.
Phys Rev Lett. 2020 Apr 3;124(13):133903. doi: 10.1103/PhysRevLett.124.133903.
We study the fundamental limit on the localization precision for a subwavelength scatterer embedded in a strongly scattering environment, using the external degrees of freedom provided by wavefront shaping. For a weakly scattering target, the localization precision improves with the value of the local density of states at the target position. For a strongly scattering target, the localization precision depends on the dressed polarizability that includes the backaction of the environment. This numerical study provides new insights for the control of the information content of scattered light by wavefront shaping, with potential applications in sensing, imaging, and nanoscale engineering.
我们利用波前整形提供的外部自由度，研究了嵌入强散射环境中的亚波长散射体的定位精度的基本极限。对于弱散射目标，定位精度随目标位置处的局部态密度值而提高。对于强散射目标，定位精度取决于包含环境反作用的修饰极化率。这项数值研究为通过波前整形控制散射光的信息内容提供了新的见解，在传感、成像和纳米尺度工程中有潜在应用。
