Wei Le, Qian Jingjing, Dong Liang, Lu Meng
Department of Electrical and Computer Engineering, Iowa State University, 2115 Coover Hall, Ames, IA, 50011, USA.
Department of Electrical and Computer Engineering, Department of Mechanical Engineering, Iowa State University, 2128 Coover Hall, Ames, IA, 50011, USA.
Small. 2020 May;16(19):e2000472. doi: 10.1002/smll.202000472. Epub 2020 Apr 20.
This work presents a low-cost, large-scale nanofabrication approach that combines imprint lithography and silver doping (IL-SD) to pattern chalcogenide glass (ChG) films for realizing IR devices. The IL-SD method involves controled photodoping of silver (Ag) atoms into ChG films and selective removing of undoped ChG. For photodoping of Ag, an Ag-coated elastomer stamp is brought in contact with the ChG film and exposed to ultraviolet light, and subsequently, the Ag atoms are photo-dissolved into the ChG film following the nanopatterns on the elastomer stamp. Due to the high wet-etching selectivity of the undoped ChG to Ag-doped one, the ChG film can be precisely patterned with a spatial resolution on the order of a few tens of nanometers. Also, by controling the lateral diffusion of Ag atoms during ultraviolet exposure, it is possible to adjust the size of the final patterns formed in the ChG film. As an application demonstration of the IL-SD process, the As S -based near-infrared photonic crystals (PhCs) in the wavelength range and flexible midinfrared PhCs are formed, and their optical resonances are investigated. The IL-SD process enables the low-cost fabrication of ChG nanostructures on different substrate materials and gives a great promise to realize various IR devices.
这项工作提出了一种低成本、大规模的纳米制造方法,该方法将压印光刻和银掺杂(IL-SD)相结合,以对硫族化物玻璃(ChG)薄膜进行图案化,从而实现红外器件。IL-SD方法包括将银(Ag)原子可控地光掺杂到ChG薄膜中,并选择性去除未掺杂的ChG。对于Ag的光掺杂,将涂有Ag的弹性体印章与ChG薄膜接触并暴露于紫外光下,随后,Ag原子按照弹性体印章上的纳米图案光溶解到ChG薄膜中。由于未掺杂的ChG对掺杂Ag的ChG具有高湿法蚀刻选择性,ChG薄膜可以以几十纳米量级的空间分辨率精确图案化。此外,通过控制紫外曝光期间Ag原子的横向扩散,可以调整在ChG薄膜中形成的最终图案的尺寸。作为IL-SD工艺的应用演示,形成了波长范围内基于As S的近红外光子晶体(PhC)和柔性中红外PhC,并对它们的光学共振进行了研究。IL-SD工艺能够在不同衬底材料上低成本制造ChG纳米结构,并为实现各种红外器件带来了巨大希望。