Shin Yun-Ho, Moon Seok-Jun, Kim Yong-Ju, Oh Ki-Yong
Department of Safety Engineering, Chungbuk National University, Chungbuk 28644, Korea.
Department of System Dynamics, Korea Institute of Machinery and Materials, Daejeon 305-343, Korea.
Sensors (Basel). 2020 Apr 17;20(8):2277. doi: 10.3390/s20082277.
A vibration isolator embedded in precision equipment, such as a scanning electron microscope (SEM), wafer inspection equipment, and nanoimprint lithography equipment, play a critical role in achieving the maximum performance of the equipment during the fabrication of nano/micro-electro-mechanical systems. In this study, the factors that degrade the performance of SEM equipment with isolation devices are classified and discussed, and improvement measures are proposed from the viewpoints of the measured image patterns and vibrations in comparison with the relevant vibration criteria. In particular, this study quantifies the image patterns measured using SEMs, and the results are discussed along with the measured vibration. A guide for the selection of mounting equipment is presented by performing vibration analysis on the lower mount of the dual elastic mount configuration applied to the SEM, as well as the image patterns analyzed with that configuration. In addition, design modifications for the mount and its arrangement are suggested based on impact tests and numerical simulations.
嵌入在精密设备（如扫描电子显微镜（SEM）、晶圆检测设备和纳米压印光刻设备）中的隔振器，在纳米/微机电系统制造过程中实现设备的最大性能方面起着关键作用。在本研究中，对带有隔振装置的SEM设备性能下降的因素进行了分类和讨论，并从测量图像模式和振动的角度，与相关振动标准进行比较，提出了改进措施。特别是，本研究对使用SEM测量的图像模式进行了量化，并将结果与测量的振动一起进行了讨论。通过对应用于SEM的双弹性安装配置的下部安装进行振动分析，以及对该配置分析的图像模式，给出了安装设备选择指南。此外，还基于冲击试验和数值模拟，对安装座及其布置提出了设计改进建议。
