Werner Florian, Veith-Wolf Boris, Melchiorre Michele, Babbe Finn, Schmidt Jan, Siebentritt Susanne
University of Luxembourg, Laboratory for Photovoltaics, Department of Physics and Materials Science, 41 rue du Brill, L-4422, Belvaux, Luxembourg.
Institute for Solar Energy Research Hamelin (ISFH), Am Ohrberg 1, D-31860, Emmerthal, Germany.
Sci Rep. 2020 May 5;10(1):7530. doi: 10.1038/s41598-020-64448-9.
In the search for highly transparent and non-toxic alternative front layers replacing state-of-the-art CdS in Cu(In,Ga)Se thin-film solar cells, alternatives rarely exceed reference devices in terms of efficiency. Full-area ultra-thin aluminium oxide tunnelling layers do not require any contact patterning and thus overcome the main drawback of insulating passivation layers. Even a few monolayers of aluminium oxide can be deposited in a controlled manner by atomic layer deposition, they show excellent interface passivation properties, low absorption, and suitable current transport characteristics on test devices. Depositing a ZnO-based transparent front contact, however, results in extremely poor solar cell performance. The issue is not necessarily a low quality of the alternative front layer, but rather the intricate relation between front layer processing and electronic bulk properties in the absorber layer. We identify three challenges critical for the development of novel front passivation approaches: (i) both Cd and Zn impurities beneficially reduce the high native net dopant concentration in the space charge region, (ii) sputter deposition of ZnO damages the passivation layer resulting in increased interface recombination, (iii) thermal treatments of devices with ZnO layer result in substantial Zn diffusion, which can penetrate the full absorber thickness already at moderate temperatures.
在寻找用于铜铟镓硒(Cu(In,Ga)Se)薄膜太阳能电池中替代现有硫化镉(CdS)的高透明度且无毒的替代前层时,很少有替代品在效率方面能超过参考器件。全区域超薄氧化铝隧穿层不需要任何接触图案化,从而克服了绝缘钝化层的主要缺点。即使是几层氧化铝也可以通过原子层沉积以可控的方式沉积,它们在测试器件上表现出优异的界面钝化性能、低吸收率和合适的电流传输特性。然而,沉积基于氧化锌(ZnO)的透明前接触会导致太阳能电池性能极差。问题不一定在于替代前层的质量低,而是前层处理与吸收层中的电子体性质之间复杂的关系。我们确定了新型前钝化方法开发中至关重要的三个挑战:(i)镉和锌杂质都能有益地降低空间电荷区中高的本征净掺杂剂浓度,(ii)氧化锌的溅射沉积会损坏钝化层,导致界面复合增加,(iii)对带有氧化锌层的器件进行热处理会导致大量锌扩散,在中等温度下就可能穿透整个吸收层厚度。