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在固体基底上高度稳定的单片UiO-66-NH金属有机框架薄膜的液相准外延生长

Liquid-Phase Quasi-Epitaxial Growth of Highly Stable, Monolithic UiO-66-NH MOF thin Films on Solid Substrates.

作者信息

Hashem Tawheed, Valadez Sánchez Elvia P, Weidler Peter G, Gliemann Hartmut, Alkordi Mohamed H, Wöll Christof

机构信息

Institute of Functional Interfaces (IFG) Karlsruhe Institute of Technology (KIT) Hermann-von-Helmholtz-Platz 1 76344 Eggenstein-Leopoldshafen Germany.

Institute for Micro Process Engineering (IMVT) Karlsruhe Institute of Technology (KIT) Hermann-von-Helmholtz-Platz 1 76344 Eggenstein-Leopoldshafen Germany.

出版信息

ChemistryOpen. 2020 May 4;9(5):514. doi: 10.1002/open.202000085. eCollection 2020 May.

DOI:10.1002/open.202000085
PMID:32373420
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC7197083/
Abstract

Invited for this month's cover is the group of Dr. Tawheed Hashem from the Karlsruhe Institute of Technology. The cover picture shows a successful synthesis of high quality, monolithic UiO-66-NH MOF thin films on diverse solid substrates via a low-temperature liquid phase epitaxy method. The achievement of continuous MOF-coatings with low defect densities and pronounced stability against high temperatures and hot water was proven. The new type of coatings clearly outperforms other reported types of MOF thin films. Read the full text of their Communication at https://doi.org/10.1002/open.201900324.

摘要

本期封面文章由来自卡尔斯鲁厄理工学院的塔希德·哈希姆博士团队撰写。封面图片展示了通过低温液相外延法在多种固体基板上成功合成高质量、单片式UiO-66-NH金属有机框架（MOF）薄膜。研究证明可实现具有低缺陷密度且在高温和热水环境下具有显著稳定性的连续MOF涂层。这种新型涂层明显优于其他已报道的MOF薄膜类型。请访问https://doi.org/10.1002/open.201900324阅读他们通讯文章的全文。