Muzzillo Christopher P, Reese Matthew O, Mansfield Lorelle M
National Renewable Energy Laboratory, 15013 Denver West Pkwy, Golden, Colorado 80401, United States.
ACS Appl Mater Interfaces. 2020 Jun 10;12(23):25895-25902. doi: 10.1021/acsami.0c04958. Epub 2020 May 26.
Cracked film lithography (CFL) is an emerging method for patterning transparent conductive metal grids. CFL can be vacuum- and Ag-free, and it forms more durable grids than nanowire approaches. In spite of CFL's promising transmittance/grid sheet resistance/wire spacing tradeoffs, previous solar cell demonstrations have had relatively low performance. This work introduces macroscopic nonuniformities in the grids to improve the short-circuit current density/fill factor tradeoff in small area Cu(In,Ga)Se cells. The performance of optimized baseline grids is matched by CFL grids with microscopic openings and macroscopic patterns, culminating in a 19.3% efficient cell. Simulations show that uniform CFL grids are enhanced by patterning because it leads to better balance among shadowing, grid resistance, and transparent conductive oxide resistance losses. Thin-film module efficiency calculations are performed to highlight the performance gains that metal grids can enable by eliminating the transparent conductive oxide losses and widening monoliths. Adding the patterned CFL grids demonstrated in this work to CIGS modules is predicted to reach 0.7% higher efficiency (absolute) than screen-printed grids.
裂纹膜光刻（CFL）是一种用于制备透明导电金属网格图案的新兴方法。CFL可以无真空且无银，并且它形成的网格比纳米线方法更耐用。尽管CFL在透光率/网格薄层电阻/线间距权衡方面很有前景，但之前的太阳能电池演示性能相对较低。这项工作在网格中引入宏观不均匀性，以改善小面积铜铟镓硒（Cu(In,Ga)Se）电池的短路电流密度/填充因子权衡。具有微观开口和宏观图案的CFL网格与优化后的基线网格性能相当，最终实现了效率为19.3%的电池。模拟表明，图案化可增强均匀的CFL网格，因为它能在阴影、网格电阻和透明导电氧化物电阻损耗之间实现更好的平衡。进行了薄膜模块效率计算，以突出金属网格通过消除透明导电氧化物损耗和加宽整体结构所能实现的性能提升。预计将这项工作中展示的图案化CFL网格添加到铜铟镓硒（CIGS）模块中，效率将比丝网印刷网格高0.7%（绝对值）。
