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利用高光谱成像技术测定并定量分析新型纺织表面上包裹甘草次酸的CN-NL纳米颗粒的分布情况。

Determination and Quantification of the Distribution of CN-NL Nanoparticles Encapsulating Glycyrrhetic Acid on Novel Textile Surfaces with Hyperspectral Imaging.

作者信息

A Obisesan Kudirat, Neri Simona, Bugnicourt Elodie, Campos Inmaculada, Rodriguez-Turienzo Laura

机构信息

IRIS Technology Solutions S.L., Parc Mediterrani de la Technologia, Avda.Carl Friedrich Gauss No. 11, Castelldefels, 08860 Barcelona, Spain.

出版信息

J Funct Biomater. 2020 May 20;11(2):32. doi: 10.3390/jfb11020032.

Abstract

Chitin Lignin nanoparticles (CN-NL), standalone and encapsulating glycyrrhetic acid (GA), were applied on novel substrates for textiles to obtain antibacterial, antioxidant properties. Their homogeneous application is an important parameter that can strongly influence the final performance of the investigated textiles for its cosmetic and medical use. In this paper, hyperspectral imaging techniques combined with chemometric tools were investigated to study the distribution and quantification of CN-NL/GA on chitosan and CN-NL on pullulan substrates. To do so, samples of chitosan and pullulan impregnated with CN-NL/GA and CN-NL were analysed through Short Wave Infrared (SWIR) and Visible-Near Infrared (VisNIR) hyperspectral cameras. Two different chemometric tools for qualitative and quantitative analysis have been applied, principal component analysis (PCA) and partial least square regression (PLSR) models. Promising results were obtained in the VisNIR range, which made it possible for us to visualize the CN-NL/GA compound on chitosan and CN-NL on pullulan substrates. Additionally, the PLSR model results had determination coefficient ( R C 2 ) for calibration and cross-validation ( R C V 2 )   values of 0.983 and 0.857, respectively. Minimum values of root-mean-square error for calibration (RMSEC) and cross-validation (RMSECV) of CN-NL/GA were 0.333 and 0.993 g, respectively. The results demonstrate that hyperspectral imaging combined with chemometrics offers a powerful tool for studying the distribution on chitosan and pullulan substrates and to quantify the content of CN-NL/GA compounds on chitosan substrates.

摘要

几丁质木质素纳米颗粒(CN-NL),单独使用以及包封甘草次酸(GA)的情况下,被应用于新型纺织基材上,以获得抗菌、抗氧化性能。它们的均匀应用是一个重要参数,会强烈影响所研究的用于化妆品和医疗用途纺织品的最终性能。本文研究了将高光谱成像技术与化学计量工具相结合,以研究壳聚糖上CN-NL/GA和普鲁兰多糖基材上CN-NL的分布与定量。为此,通过短波红外(SWIR)和可见-近红外(VisNIR)高光谱相机对浸渍有CN-NL/GA和CN-NL的壳聚糖和普鲁兰多糖样品进行了分析。应用了两种不同的用于定性和定量分析的化学计量工具,主成分分析(PCA)和偏最小二乘回归(PLSR)模型。在VisNIR范围内获得了有前景的结果,这使我们能够可视化壳聚糖上的CN-NL/GA化合物以及普鲁兰多糖基材上的CN-NL。此外,PLSR模型结果的校准决定系数(R C 2)和交叉验证决定系数(R C V 2)分别为0.983和0.857。CN-NL/GA校准的均方根误差(RMSEC)和交叉验证的均方根误差(RMSECV)最小值分别为0.333和0.993 g。结果表明,高光谱成像与化学计量学相结合为研究壳聚糖和普鲁兰多糖基材上的分布以及量化壳聚糖基材上CN-NL/GA化合物的含量提供了一个强大的工具。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/0a01/7353623/b747270c7451/jfb-11-00032-g001.jpg

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