Mortelmans Wouter, Nalin Mehta Ankit, Balaji Yashwanth, Sergeant Stefanie, Meng Ruishen, Houssa Michel, De Gendt Stefan, Heyns Marc, Merckling Clement
Department of Materials Engineering, KU Leuven, Kasteelpark Arenberg 44, 3001 Leuven, Belgium.
Imec, Kapeldreef 75, 3001 Leuven, Belgium.
ACS Appl Mater Interfaces. 2020 Jun 17;12(24):27508-27517. doi: 10.1021/acsami.0c05872. Epub 2020 Jun 3.
Layered materials held together by weak van der Waals (vdW) interactions are a promising class of materials in the field of nanotechnology. Besides the potential for single layers, stacking of various vdW layers becomes even more promising since unique properties can hence be precisely engineered. The synthesis of stacked vdW layers, however, remains to date, hardly understood. Therefore, in this work, the vdW epitaxy of transition metal dichalcogenides (TMDs) on single-crystalline TMD templates is investigated in depth. It is demonstrated that the role of lattice mismatch is insignificant. More importantly is the role of surface energy, calculated using density functional theory, which plays an essential role in the activation energy for adatom diffusion, hence nucleation density. This in turn correlates with defect density since the stacking sequence in vdW epitaxy is generally poorly controlled. Moreover, the vapor pressure of the transition metal is also found to correlate with adatom diffusion. Consequently, the proposed study enables important and new insight in the vdW epitaxy of multilayer 2D homo-/heterostructures.
由弱范德华(vdW)相互作用结合在一起的层状材料是纳米技术领域一类很有前景的材料。除了单层的潜力外,各种vdW层的堆叠更具前景,因为这样可以精确设计出独特的性能。然而,迄今为止,堆叠vdW层的合成仍几乎不为人所理解。因此,在这项工作中,深入研究了过渡金属二硫属化物(TMDs)在单晶TMD模板上的vdW外延。结果表明,晶格失配的作用微不足道。更重要的是利用密度泛函理论计算出的表面能的作用,它在吸附原子扩散的活化能中起着至关重要的作用,进而影响成核密度。由于vdW外延中的堆叠顺序通常难以控制,这反过来又与缺陷密度相关。此外,还发现过渡金属的蒸气压与吸附原子扩散相关。因此,本研究所提出的内容为多层二维同质/异质结构的vdW外延提供了重要的新见解。