Zhao Min, Gou Gaoyang, Ding Xiangdong, Sun Jun
Frontier Institute of Science and Technology and State Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi' an 710049, People's Republic of China.
Nanoscale. 2020 Jun 18;12(23):12522-12530. doi: 10.1039/d0nr01475c.
Ferroelectric (FE) materials, especially ABO3 FE perovskite oxides, have been extensively studied for their important applications in memory devices, electronics and sensors. However, the integration of FE perovskite oxides into miniaturized memory and electronic devices has been impeded by the critical thickness limitation, as out-of-plane ferroelectricity in most FE perovskite oxides will disappear when the oxide thin film thickness is below a critical value. On the other side, CuInP2S6 (CIPS) nano-flake, a prototypical two-dimensional (2D) FE material, has recently been demonstrated to display stable out-of-plane ferroelectricity at the atomic layer thickness by experiment, which offers a new candidate for developing FE devices in the 2D nanoscale regime. Herein, after investigation of the structural and ferroelectric properties of 2D CIPS layers, especially the interactions between out-of-plane polarization and the corresponding depolarization field using first-principles calculations, we reveal that out-of-plane ferroelectricity can even persist in the CIPS monolayer, which is only 3.4 Å in thickness. Moreover, in order to explore the potential application of 2D FE CIPS layers as minimized FE devices, we design an ultrathin ferroelectric tunneling junction (FTJ) composed of a graphene/CIPS monolayer/graphene vertical van der Waals (vdW) heterostructure. Our transport simulations based on the non-equilibrium Green's function formalism predict that such an ultrathin FTJ device can still exhibit the typical tunneling electroresistance (TER) effect, where tunneling current strongly depends on the direction of FE polarization. Our work not only elucidates the origin of stable out-of-plane ferroelectricity appearing in 2D CIPS layers, but also demonstrates the practical application of a CIPS based 2D FTJ as a miniaturized, multi-functional and low-power consumption memory device for modern electronics.
铁电(FE)材料,尤其是ABO3铁电钙钛矿氧化物,因其在存储器件、电子学和传感器中的重要应用而受到广泛研究。然而,铁电钙钛矿氧化物在小型化存储和电子器件中的集成受到临界厚度限制的阻碍,因为大多数铁电钙钛矿氧化物中的面外铁电性在氧化物薄膜厚度低于临界值时会消失。另一方面,CuInP2S6(CIPS)纳米片,一种典型的二维(2D)铁电材料,最近通过实验证明在原子层厚度时能表现出稳定的面外铁电性,这为在二维纳米尺度开发铁电器件提供了新的候选材料。在此,在研究二维CIPS层的结构和铁电性能,特别是使用第一性原理计算研究面外极化与相应退极化场之间的相互作用后,我们发现面外铁电性甚至可以在仅3.4 Å厚的CIPS单层中持续存在。此外,为了探索二维铁电CIPS层作为最小化铁电器件的潜在应用,我们设计了一种由石墨烯/CIPS单层/石墨烯垂直范德华(vdW)异质结构组成的超薄铁电隧道结(FTJ)。我们基于非平衡格林函数形式的输运模拟预测,这样的超薄FTJ器件仍能表现出典型的隧道电阻(TER)效应,其中隧道电流强烈依赖于铁电极化方向。我们的工作不仅阐明了二维CIPS层中出现稳定面外铁电性的起源,还展示了基于CIPS的二维FTJ作为现代电子学中微型化、多功能和低功耗存储器件的实际应用。