Jia Tingting, Chen Yanrong, Cai Yali, Dai Wenbin, Zhang Chong, Yu Liang, Yue Wenfeng, Kimura Hideo, Yao Yingbang, Yu Shuhui, Guo Quansheng, Cheng Zhenxiang
Institute of Advanced Materials Science and Engineering, Shenzhen Institutes of Advanced Technology, Chinese Academy of Sciences, Shenzhen 518055, China.
School of Materials Science and Engineering, Hubei University, Wuhan 430062, China.
Nanomaterials (Basel). 2022 Jul 22;12(15):2516. doi: 10.3390/nano12152516.
CuInP2S6 (CIPS) is a novel two-dimensional (2D) van der Waals (vdW) ferroelectric layered material with a Curie temperature of ~315 K, making it promising for great potential applications in electronic and photoelectric devices. Herein, the ferroelectric and electric properties of CIPS at different thicknesses are carefully evaluated by scanning probe microscopy techniques. Some defects in some local regions due to Cu deficiency lead to a CuInP2S6-InPS (CIPS-IPS) paraelectric phase coexisting with the CIPS ferroelectric phase. An electrochemical strain microscopy (ESM) study reveals that the relaxation times corresponding to the Cu ions and the IPS ionospheres are not the same, with a significant difference in their response to DC voltage, related to the rectification effect of the ferroelectric tunnel junction (FTJ). The electric properties of the FTJ indicate Cu ion migration and propose that the current flow and device performance are dynamically controlled by an interfacial Schottky barrier. The addition of the ferroelectricity of CIPS opens up applications in memories and sensors, actuators, and even spin-orbit devices based on 2D vdW heterostructures.
铜铟磷二硫化物(CIPS)是一种新型的二维(2D)范德华(vdW)铁电层状材料,居里温度约为315 K,这使其在电子和光电器件中具有巨大的潜在应用前景。在此,通过扫描探针显微镜技术仔细评估了不同厚度的CIPS的铁电和电学性质。由于铜缺乏,一些局部区域存在一些缺陷,导致铜铟磷二硫化物-铟磷硫化物(CIPS-IPS)顺电相与CIPS铁电相共存。一项电化学应变显微镜(ESM)研究表明,与铜离子和IPS电离层相对应的弛豫时间不同,它们对直流电压的响应存在显著差异,这与铁电隧道结(FTJ)的整流效应有关。FTJ的电学性质表明铜离子迁移,并提出电流流动和器件性能由界面肖特基势垒动态控制。CIPS铁电性的加入为基于二维vdW异质结构的存储器、传感器、致动器甚至自旋轨道器件开辟了应用前景。