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用于高效稳定钙钛矿太阳能电池的氧化镍/钙钛矿异质结接触工程

NiO/Perovskite Heterojunction Contact Engineering for Highly Efficient and Stable Perovskite Solar Cells.

作者信息

Zhang Bingjuan, Su Jie, Guo Xing, Zhou Long, Lin Zhenhua, Feng Liping, Zhang Jincheng, Chang Jingjing, Hao Yue

机构信息

State Key Discipline Laboratory of Wide Band Gap Semiconductor Tecchnology Shaanxi Joint Key Laboratory of Graphene Advanced Interdisciplinary Research Center for Flexible Electronics School of Microelectronics Xidian University 2 South Taibai Road Xi'an 710071 China.

Department of Applied Physical Sciences University of North Carolina at Chapel Hill Chapel Hill NC 27599 USA.

出版信息

Adv Sci (Weinh). 2020 Apr 7;7(11):1903044. doi: 10.1002/advs.201903044. eCollection 2020 Jun.

Abstract

Recent research shows that the interface state in perovskite solar cells is the main factor which affects the stability and performance of the device, and interface engineering including strain engineering is an effective method to solve this issue. In this work, a CsBr buffer layer is inserted between NiO hole transport layer and perovskite layer to relieve the lattice mismatch induced interface stress and induce more ordered crystal growth. The experimental and theoretical results show that the addition of the CsBr buffer layer optimizes the interface between the perovskite absorber layer and the NiO hole transport layer, reduces interface defects and traps, and enhances the hole extraction/transfer. The experimental results show that the power conversion efficiency of optimal device reaches up to 19.7% which is significantly higher than the efficiency of the device without the CsBr buffer layer. Meanwhile, the device stability is also improved. This work provides a deep understanding of the NiO /perovskite interface and provides a new strategy for interface optimization.

摘要

近期研究表明,钙钛矿太阳能电池中的界面态是影响器件稳定性和性能的主要因素,包括应变工程在内的界面工程是解决这一问题的有效方法。在这项工作中,在NiO空穴传输层和钙钛矿层之间插入CsBr缓冲层,以缓解晶格失配引起的界面应力,并诱导更有序的晶体生长。实验和理论结果表明,CsBr缓冲层的加入优化了钙钛矿吸收层与NiO空穴传输层之间的界面,减少了界面缺陷和陷阱,并增强了空穴提取/转移。实验结果表明,最优器件的功率转换效率高达19.7%,显著高于没有CsBr缓冲层的器件效率。同时,器件稳定性也得到了提高。这项工作为深入理解NiO/钙钛矿界面提供了依据,并为界面优化提供了新策略。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3888/7284208/645d7b758ef2/ADVS-7-1903044-g001.jpg

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