Bulkin Pavel, Gaiaschi Sofia, Chapon Patrick, Daineka Dmitri, Kundikova Natalya
Opt Express. 2020 May 25;28(11):15753-15760. doi: 10.1364/OE.388546.
The problem of protection of the front surface silver mirrors is a very important one for a number of applications. The atomic layer deposition (ALD) technique provides an efficient way to form a coating, protecting the sensitive surface of silver from a corrosive and oxidizing environment. Moreover, the ALD layer provides extremely high conformality (even when deposited over high aspect ratio features) and has high integrity, efficiently blocking foreign species diffusion to the silver-overcoat interface. We tested the efficiency of the protection of silver mirrors against oxygen plasma exposure by the ALD-deposited AlO layers by combining spectroscopic ellipsometry, reflection measurements and pulsed glow-discharge optical emission spectroscopy (GD-OES) profiling. We have found that for optimal protection, the thickness of the ALD deposited layer should exceed at least 15 nm (about 150 ALD cycles at 150°C). We have also demonstrated that the deposition of 15 nm of a protective ALD-deposited AlO layer does not affect the absolute reflectivity of a silver mirror in the spectral range 320 -2500 nm.
对于许多应用而言,前表面银镜的保护问题非常重要。原子层沉积(ALD)技术提供了一种形成涂层的有效方法,可保护银的敏感表面免受腐蚀性和氧化性环境的影响。此外,ALD层具有极高的保形性(即使沉积在高纵横比特征上)且具有高完整性,能有效阻止外来物质扩散到银涂层界面。我们通过结合光谱椭偏仪、反射测量和脉冲辉光放电光发射光谱(GD-OES)剖析,测试了ALD沉积的AlO层对银镜抵御氧等离子体暴露的保护效率。我们发现,为实现最佳保护,ALD沉积层的厚度应至少超过15 nm(在150°C下约150个ALD循环)。我们还证明,沉积15 nm的保护性ALD沉积AlO层不会影响银镜在320 - 2500 nm光谱范围内的绝对反射率。