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钒酸铋中的钼缺陷复合体

Molybdenum defect complexes in bismuth vanadate.

作者信息

Marinho Enesio, Rocha Leão Cedric

机构信息

Federal University of ABC (UFABC), 09210-580 Santo André, São Paulo, Brazil.

出版信息

Phys Chem Chem Phys. 2020 Jul 22;22(28):16277-16285. doi: 10.1039/d0cp02584d.

Abstract

Monoclinic bismuth vanadate (BiVO4) is a promising n-type semiconductor for applications in sunlight-driven water splitting. Several studies have shown that its photocatalytic activity is greatly enhanced by high concentrations of Mo and W dopants. In the present work, we performed ab initio calculations to assess the most favorable relative position between pairs of Mo dopants in BiVO4. Surprisingly, we verify that the lowest energy configuration for MoV pairwise defects in BiVO4 occurs on nearest-neighbor sites, despite the higher electrostatic repulsion and larger strain on the crystal lattice. Similar results were observed for WV defect pairs in W-doped BiVO4. We show that the origin of this effect lies in a favorable hybridization between the atomic orbitals of the impurities that is only verified when they are closest to each other, resulting in an enthalpy gain that overcomes the repulsive components of the pair formation energy. As a consequence, Mo and/or W doped BiVO4 are likely to present donor-donor defect complexes, which is an outcome that can be applied in experimental approaches for improving the photocatalytic activity of these metal oxides.

摘要

单斜钒酸铋(BiVO4)是一种很有前景的n型半导体,可用于阳光驱动的水分解。多项研究表明,高浓度的钼(Mo)和钨(W)掺杂剂可大大提高其光催化活性。在本工作中,我们进行了从头算计算,以评估BiVO4中钼掺杂剂对之间最有利的相对位置。令人惊讶的是,我们证实,尽管BiVO4中MoV成对缺陷在最近邻位点上会产生更高的静电排斥和更大的晶格应变,但其最低能量构型仍出现在最近邻位点上。在W掺杂的BiVO4中的WV缺陷对中也观察到了类似结果。我们表明,这种效应的起源在于杂质原子轨道之间有利的杂化,这种杂化只有在它们彼此最接近时才会得到证实,从而导致焓增,克服了成对形成能的排斥成分。因此,Mo和/或W掺杂的BiVO4可能会出现施主-施主缺陷复合体,这一结果可应用于提高这些金属氧化物光催化活性的实验方法中。

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