Rapid fabrication of high-resolution multi-scale microfluidic devices based on the scanning of patterned femtosecond laser.

Femtosecond-laser-induced two-photon polymerization has distinct advantages in micro-nanofabrication due to its intrinsic three-dimensional processing capability and high precision with sub-100 nanometer fabrication resolution. However, the high resolution causes a drawback in fabricating large-scale structures due to unacceptably long processing times. To solve this problem, we applied the patterned focus as the basic element for scanning processing. Theoretically, the relationship between patterned-focus scanning parameters and the uniformity of scanned light field was analyzed and optimized. Experimentally, we quantitatively investigated the relationship between the microstructure surface quality and the parameters of patterned-focus scanning. Based on above, we put forward a hybrid method that combines the femtosecond laser patterned exposure with direct-writing fabrication to rapidly fabricate large-scale microfluidic devices for various practical applications.