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钌锑的高正磁电阻和能带结构

High Positive MR and Energy Band Structure of RuSb.

作者信息

Zhang Liang, Wang Yun, Chang Hong

机构信息

School of Physical Science and Technology, Inner Mongolia University, Hohhot 010021, China.

出版信息

Materials (Basel). 2020 Jul 15;13(14):3159. doi: 10.3390/ma13143159.

Abstract

A high positive magnetoresistance (MR), 78%, is observed at 2 K on the plane of the diamagnetic RuSb semiconductor. On the plane, MR is 44% at 2 K, and about 7% at 300 K. MR at different temperatures do not follow the Kohler's rule. It suggests that the multiband effect plays a role on the carrier transportation. RuSb is a semiconductor with both positive and negative carriers. The quantum interference effect with the weak localization correction lies behind the high positive MR at low temperature. Judged from the ultraviolet-visible spectra, it has a direct band gap of 1.29 eV. The valence band is 0.39 eV below the Fermi energy. The schematic energy band structure is proposed based on experimental results.

摘要

在抗磁性RuSb半导体的平面上,2K时观察到高达78%的高正磁电阻(MR)。在平面上,2K时MR为44%,300K时约为7%。不同温度下的MR不遵循科勒规则。这表明多带效应对载流子输运起作用。RuSb是一种具有正负载流子的半导体。低温下高正MR背后是具有弱局域化修正的量子干涉效应。从紫外可见光谱判断,其直接带隙为1.29eV。价带比费米能量低0.39eV。基于实验结果提出了示意性能带结构。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7da8/7412452/cfb7732beda3/materials-13-03159-g001.jpg

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