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一项队列研究表明,头臂静脉动静脉瘘通路中的低壁切应力与颅弓狭窄相对应。

A cohort study showing correspondence of low wall shear stress and cephalic arch stenosis in brachiocephalic arteriovenous fistula access.

机构信息

Department of Medicine, Section of Nephrology, University of Chicago, Chicago, IL, USA.

Department of Mechanical, Materials and Aerospace Engineering, Illinois Institute of Technology, Chicago, IL, USA.

出版信息

J Vasc Access. 2021 May;22(3):380-387. doi: 10.1177/1129729820942048. Epub 2020 Jul 21.

Abstract

BACKGROUND

A brachiocephalic fistula is frequently placed for hemodialysis; unfortunately, cephalic arch stenosis commonly develops, leading to failure. We hypothesized that a contribution to brachiocephalic fistula failure is low wall shear stress resulting in neointimal hyperplasia leading to venous stenosis. The objective of this investigation is to determine correspondence of low wall shear stress and the development of cephalic arch stenosis.

METHODS

Forty subjects receiving hemodialysis with a primary brachiocephalic fistula access were followed from time of placement for 3 years or until cephalic arch stenosis. Venogram, Doppler, and viscosity were performed at time of fistula maturation, annually for 3 years or to time of cephalic arch stenosis. Computational hemodynamics modeling was performed to determine location and percent low wall shear stress in the arch. The relationship between wall shear stress at time of maturation and location of cephalic arch stenosis were estimated by correlating computational modeling and quadrant location of cephalic arch stenosis.

RESULTS

In total, 32 subjects developed cephalic arch stenosis with 26 displaying correspondence between location of low wall shear stress at time of maturation and subsequent cephalic arch stenosis, whereas 6 subjects did not (p = 0.0015). Most subjects with correspondence had low wall shear stress areas evident in greater than 20% of the arch (p = 0.0006). Low wall shear stress was associated with a higher risk of cephalic arch stenosis in the 23-to-45 age group (p = 0.0029).

CONCLUSIONS

The presence and magnitude of low wall shear stress in the cephalic arch is a factor associated with development of cephalic arch stenosis in patients with brachiocephalic fistula. Attenuation of low wall shear stress at time of maturation may help prevent the development of cephalic arch stenosis which is difficult to treat once it develops.

摘要

背景

头臂静脉内瘘常用于血液透析,但头臂静脉弓狭窄常导致内瘘失功。我们推测,内瘘失功的原因之一是低壁切应力导致新生内膜过度增生,进而引起静脉狭窄。本研究旨在明确低壁切应力与头臂静脉弓狭窄的相关性。

方法

40 例首次行头臂静脉内瘘的血液透析患者,在瘘成熟后 3 年内或出现头臂静脉弓狭窄时进行随访。在瘘成熟时、每年进行 1 次静脉造影、多普勒超声和血液黏度检查,直至出现头臂静脉弓狭窄。通过计算血流动力学模型,确定弓部的低壁切应力位置和百分比。采用相关分析,将成熟时壁切应力与头臂静脉弓狭窄的位置进行相关性分析。

结果

共 32 例患者发生头臂静脉弓狭窄,其中 26 例低壁切应力位置与头臂静脉弓狭窄的位置相对应,而 6 例患者不对应(p=0.0015)。大多数对应患者的低壁切应力区域超过弓部的 20%(p=0.0006)。低壁切应力与 23~45 岁年龄组头臂静脉弓狭窄的风险增加相关(p=0.0029)。

结论

头臂静脉弓内低壁切应力的存在及其程度是头臂静脉内瘘患者头臂静脉弓狭窄发生的相关因素。成熟时低壁切应力的减弱可能有助于预防头臂静脉弓狭窄的发生,因为一旦发生狭窄,治疗难度较大。

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