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单个硅纳米线的原位透射电子显微镜修饰及其电荷传输机制。

In situ TEM modification of individual silicon nanowires and their charge transport mechanisms.

作者信息

Alam Sardar B, Andersen Christopher R, Panciera Federico, Nilausen Aage A S, Hansen Ole, Ross Frances M, Mølhave Kristian

机构信息

National Centre for Nano Fabrication and Characterization, Technical University of Denmark, 2800 Kgs. Lyngby, Denmark.

University of Paris-Saclay, CNRS, Centre for Nanoscience and Nanotechnology, 91120 Palaiseau, France.

出版信息

Nanotechnology. 2020 Dec 4;31(49):494002. doi: 10.1088/1361-6528/ababc8.

DOI:10.1088/1361-6528/ababc8
PMID:32746444
Abstract

Correlating the structure and composition of nanowires grown by the vapour-liquid-solid (VLS) mechanism with their electrical properties is essential for designing nanowire devices. In situ transmission electron microscopy (TEM) that can image while simultaneously measuring the current-voltage (I-V) characteristics of individual isolated nanowires is a unique tool for linking changes in structure with electronic transport. Here we grow and electrically connect silicon nanowires inside a TEM to perform in situ electrical measurements on individual nanowires both at high temperature and upon surface oxidation, as well as under ambient conditions. As-grown, the oxide-free nanowires have nonlinear I-V characteristics. We analyse the I-V measurements in terms of both bulk and injection limited transport models, finding Joule heating effects, bulk-limiting effects for thin nanowires and an injection-limiting effect for thick wires when high voltages are applied. When the nanowire surface is modified by in situ oxidation, drastic changes occur in the electronic properties. We investigate the relation between the observed geometry, changes in the surface structure and changes in electronic transport, obtaining information for individual nanowires that is inaccessible to other measuring techniques.

摘要

将通过气-液-固(VLS)机制生长的纳米线的结构和组成与其电学性质相关联,对于设计纳米线器件至关重要。原位透射电子显微镜(TEM)能够在成像的同时测量单个孤立纳米线的电流-电压(I-V)特性,是将结构变化与电子输运联系起来的独特工具。在此,我们在TEM内部生长并电连接硅纳米线,以便在高温、表面氧化以及环境条件下对单个纳米线进行原位电学测量。刚生长出来时,无氧化物的纳米线具有非线性I-V特性。我们根据体输运和注入限制输运模型分析I-V测量结果,发现焦耳热效应、细纳米线的体限制效应以及高电压下粗纳米线的注入限制效应。当通过原位氧化对纳米线表面进行改性时,其电学性质会发生剧烈变化。我们研究了观察到的几何形状、表面结构变化与电子输运变化之间的关系,获得了其他测量技术无法获取的单个纳米线的信息。

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