Hou Yuan, Ren Xibiao, Fan Jingcun, Wang Guorui, Dai Zhaohe, Jin Chuanhong, Wang Wenxiang, Zhu Yinbo, Zhang Shuai, Liu Luqi, Zhang Zhong
CAS Key Laboratory of Mechanical Behavior and Design of Materials, Department of Modern Mechanics, University of Science and Technology of China, Hefei 230027, P. R. China.
CAS Key Laboratory of Nanosystem and Hierarchical Fabrication and CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing 100190, P. R. China.
ACS Appl Mater Interfaces. 2020 Sep 9;12(36):40958-40967. doi: 10.1021/acsami.0c12000. Epub 2020 Aug 26.
Assembling monolayers into a bilayer system unlocks the rotational free degree of van der Waals (vdW) homo/heterostructure, enabling the building of twisted bilayer graphene (tBLG) which possesses novel electronic, optical, and mechanical properties. Previous methods for preparation of homo/heterstructures inevitably leave the polymer residue or hexagonal boron nitride (-BN) mask, which usually obstructs the measurement of intrinsic mechanical and surface properties of tBLG. Undoubtedly, to fabricate the designable tBLG with clean interface and surface is necessary but challenging. Here, we propose a simple and handy method to prepare atomically clean twisted bilayer graphene with controllable twist angles based on wetting-induced delamination. This method can transfer tBLG onto a patterned substrate, which offers an excellent platform for the observation of physical phenomena such as relaxation of moiré pattern in marginally tBLG. These findings and insight should ultimately guide the designable packaging and atomic characterization of the two-dimensional (2D) materials.
将单层组装成双层系统可释放范德华（vdW）同质/异质结构的旋转自由度，从而能够构建具有新颖电学、光学和机械性能的扭曲双层石墨烯（tBLG）。先前制备同质/异质结构的方法不可避免地会留下聚合物残余物或六方氮化硼（-BN）掩膜，这通常会阻碍对tBLG本征力学和表面性能的测量。毫无疑问，制造具有清洁界面和表面的可设计tBLG是必要的，但具有挑战性。在此，我们提出一种基于湿敏诱导分层制备具有可控扭曲角的原子级清洁扭曲双层石墨烯的简单便捷方法。该方法可将tBLG转移到图案化衬底上，为观察诸如边缘tBLG中莫尔条纹弛豫等物理现象提供了一个极佳的平台。这些发现和见解最终应能指导二维（2D）材料的可设计封装和原子表征。
