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利用布拉格相干X射线成像沿单根氮化镓线绘制反演域边界

Mapping Inversion Domain Boundaries along Single GaN Wires with Bragg Coherent X-ray Imaging.

作者信息

Li Ni, Labat Stéphane, Leake Steven J, Dupraz Maxime, Carnis Jérôme, Cornelius Thomas W, Beutier Guillaume, Verdier Marc, Favre-Nicolin Vincent, Schülli Tobias U, Thomas Olivier, Eymery Joël, Richard Marie-Ingrid

机构信息

Univiversité Grenoble Alpes, CEA Grenoble, IRIG, MEM, NRS, 17 rue des Martyrs, 38000 Grenoble, France.

ESRF, The European Synchrotron, 71 Avenue des Martyrs, 38000 Grenoble, France.

出版信息

ACS Nano. 2020 Aug 25;14(8):10305-10312. doi: 10.1021/acsnano.0c03775. Epub 2020 Aug 10.

Abstract

Gallium nitride (GaN) is of technological importance for a wide variety of optoelectronic applications. Defects in GaN, like inversion domain boundaries (IDBs), significantly affect the electrical and optical properties of the material. We report, here, on the structural configurations of planar inversion domain boundaries inside n-doped GaN wires measured by Bragg coherent X-ray diffraction imaging. Different complex domain configurations are revealed along the wires with a 9 nm in-plane spatial resolution. We demonstrate that the IDBs change their direction of propagation along the wires, promoting Ga-terminated domains and stabilizing into {11̅00}, that is, -planes. The atomic phase shift between the Ga- and N-terminated domains was extracted using phase-retrieval algorithms, revealing an evolution of the out-of-plane displacement (∼5 pm, at maximum) between inversion domains along the wires. This work provides an accurate inner view of planar defects inside small crystals.

摘要

氮化镓(GaN)在众多光电子应用中具有重要的技术意义。GaN中的缺陷,如反演畴界(IDB),会显著影响材料的电学和光学性质。在此,我们报告通过布拉格相干X射线衍射成像测量的n型掺杂GaN线内平面反演畴界的结构构型。以9纳米的面内空间分辨率揭示了沿导线的不同复杂畴构型。我们证明,IDB会改变其沿导线的传播方向,促进Ga端接畴并稳定为{11̅00},即 - 平面。使用相位恢复算法提取了Ga端接畴和N端接畴之间的原子相移,揭示了沿导线反演畴之间面外位移(最大约5皮米)的演变。这项工作提供了小晶体内部平面缺陷的精确内部视图。

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