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混合TiO-SiO薄膜的紫外线和X射线光敏性比较

Comparison between the UV and X-ray Photosensitivities of Hybrid TiO-SiO Thin Layers.

作者信息

Royon Maxime, Vocanson Francis, Jamon Damien, Marin Emmanuel, Morana Adriana, Boukenter Aziz, Girard Sylvain, Ouerdane Youcef, Royer François, Jourlin Yves

机构信息

Univ Lyon, Laboratoire H. Curien, UJM-CNRS-IOGS, 18 rue du Pr. 42000 Benoît Lauras, Saint-Etienne, France.

出版信息

Materials (Basel). 2020 Aug 24;13(17):3730. doi: 10.3390/ma13173730.

DOI:10.3390/ma13173730
PMID:32846972
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC7503596/
Abstract

The photo-induced effects on sol-gel-based organo TiO-SiO thin layers deposited by the dip-coating technique have been investigated using two very different light sources: A light-emitting diode (LED) emitting in the UV (at 365 nm, 3.4 eV) and an X-ray tube producing 40 keV mean-energy photons. The impact of adding a photo-initiator (2,2-dimethoxy-2-phenylacetophenone-DMPA) on the sol-gel photosensitivity is characterized namely in terms of the photo-induced refractive index measured through M-line spectroscopy. Results show that both silica-titania sol-gel films with or without the photo-initiator are photosensitive to both photon sources. The induced refractive index values reveal several features where slightly higher refractive indexes are obtained for the sol-gel containing the photo-initiator. UV and X-ray-induced polymerization degrees are discussed using Fourier-transform infrared (FTIR) spectroscopy where the densification of hybrid TiO-SiO layers is related to the consumption of the CH=C groups and to the decomposition of Si-OH and Si-O-CH bonds. X-rays are more efficient at densifying the TiO-SiO inorganic and organic network with respect to the UV photons. Hard X-ray photolithography, where no cracks or damages are observed after intense exposition, can be a promising technique to design submicronic-structure patterns on TiO-SiO thin layers for the building of optical sensors.

摘要

利用两种截然不同的光源，研究了浸涂技术制备的基于溶胶-凝胶的有机TiO-SiO薄膜的光致效应：一种是发射紫外线（波长365nm，能量3.4eV）的发光二极管（LED），另一种是产生平均能量为40keV光子的X射线管。添加光引发剂（2,2-二甲氧基-2-苯基苯乙酮-DMPA）对溶胶-凝胶光敏性的影响，具体通过M线光谱法测量的光致折射率来表征。结果表明，无论有无光引发剂，二氧化硅-二氧化钛溶胶-凝胶薄膜对这两种光子源均具有光敏性。诱导折射率值显示出几个特征，含有光引发剂的溶胶-凝胶获得的折射率略高。利用傅里叶变换红外（FTIR）光谱讨论了紫外线和X射线诱导的聚合度，其中混合TiO-SiO层的致密化与CH=C基团的消耗以及Si-OH和Si-O-CH键的分解有关。相对于紫外线光子，X射线在致密化TiO-SiO无机和有机网络方面更有效。硬X射线光刻在强烈曝光后未观察到裂纹或损伤，可能是一种在TiO-SiO薄膜上设计亚微米结构图案以构建光学传感器的有前途的技术。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f3b/7503596/08d0160ebf2e/materials-13-03730-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f3b/7503596/a1296cac7731/materials-13-03730-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f3b/7503596/446f94380070/materials-13-03730-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f3b/7503596/792866e686ea/materials-13-03730-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f3b/7503596/20547ab8a408/materials-13-03730-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f3b/7503596/3b1f09a0269e/materials-13-03730-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f3b/7503596/08d0160ebf2e/materials-13-03730-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f3b/7503596/a1296cac7731/materials-13-03730-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f3b/7503596/446f94380070/materials-13-03730-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f3b/7503596/792866e686ea/materials-13-03730-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f3b/7503596/20547ab8a408/materials-13-03730-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f3b/7503596/3b1f09a0269e/materials-13-03730-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/5f3b/7503596/08d0160ebf2e/materials-13-03730-g006.jpg

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本文引用的文献

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Densification of sol-gel silica thin films induced by hard X-rays generated by synchrotron radiation.同步辐射产生的硬 X 射线诱导溶胶-凝胶二氧化硅薄膜的致密化。
J Synchrotron Radiat. 2011 Mar;18(Pt 2):280-6. doi: 10.1107/S0909049510051666. Epub 2011 Jan 22.
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Measurement of thin film parameters with a prism coupler.
使用棱镜耦合器测量薄膜参数。
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Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art.聚焦于HSQ的用于低于20纳米电子束光刻的抗蚀剂：现状
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